SYSTEM AND METHOD FOR IMPLEMENTING MULTI-RESOLUTION ADVANCED PROCESS CONTROL

System and method for implementing multi-resolution advanced process control ("APC") are described. One embodiment is a method comprising obtaining low resolution metrology data and high resolution metrology data related to a process module for performing a process on the wafer; modeling a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SUNG JIN-NING, CHENG YEN-WEI, TSEN ANDY, MOU JONG-L, TSAI PO-FENG
Format:	Patent
Sprache:	eng
Schlagworte:	CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING PHYSICS
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