EVALUATING THE QUALITY OF AN ASSIST FEATURE PLACEMENT BASED ON A FOCUS-SENSITIVE COST-COVARIANCE FIELD

One embodiment of the present invention provides a system that determines an assist feature placement within a post-optical proximity correction (post-OPC) mask layout. During operation, the system receives a set of target patterns which represent a set of polygons in a pre-OPC mask layout. The syst...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	FAN YONGFA, LI JIANLIANG, BARNES LEVI D, PAINTER BENJAMIN D, YAN QILIANG, POONAWALA AMYN
Format:	Patent
Sprache:	eng
Schlagworte:	CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING PHYSICS
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