Norbornene-Type Polymers, Compositions Thereof And Lithographic Processes Using Such Compositions

Embodiments of the present invention relate generally to non-self imagable and imagable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositi...

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Bibliographische Detailangaben
Hauptverfasser: ENDO KOTARO, CHANG CHUN, KANDANARACHCHI PRAMOD, ISHIDUKA KEITA, RHODES LARRY F, ANDO TOMOYUKI, SEGER LAWRENCE D
Format: Patent
Sprache:eng
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Zusammenfassung:Embodiments of the present invention relate generally to non-self imagable and imagable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.