Methods and devices for forming nanostructure monolayers and devices including such monolayers

Methods for forming or patterning nanostructure arrays are provided. The methods involve formation of arrays on coatings comprising nanostructure association groups, formation of arrays in spin-on-dielectrics, solvent annealing after nanostructure deposition, patterning using resist, and/or use of d...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	CRUDEN KAREN CHU, CHEN JIAN, PARCE J. WALLACE, DUAN XIANGFENG, LIU CHAO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

container_end_page
container_issue
container_start_page
container_title
container_volume
creator	CRUDEN KAREN CHU CHEN JIAN PARCE J. WALLACE DUAN XIANGFENG LIU CHAO
description	Methods for forming or patterning nanostructure arrays are provided. The methods involve formation of arrays on coatings comprising nanostructure association groups, formation of arrays in spin-on-dielectrics, solvent annealing after nanostructure deposition, patterning using resist, and/or use of devices that facilitate array formation. Related devices for forming nanostructure arrays are also provided, as are devices including nanostructure arrays (e.g., memory devices).
format	Patent
fullrecord	<record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2011034038A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2011034038A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2011034038A13</originalsourceid><addsrcrecordid>eNrjZIjzTS3JyE8pVkjMS1FISS3LTE4tVkjLLwLh3My8dIW8xLz84pKi0uSS0qJUhdz8vPycxMrUIlQNmXnJOaUpIOXFpckZSKp4GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8aLCRgaGhgbGJgbGFo6ExcaoAnLo-XQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Methods and devices for forming nanostructure monolayers and devices including such monolayers</title><source>esp@cenet</source><creator>CRUDEN KAREN CHU ; CHEN JIAN ; PARCE J. WALLACE ; DUAN XIANGFENG ; LIU CHAO</creator><creatorcontrib>CRUDEN KAREN CHU ; CHEN JIAN ; PARCE J. WALLACE ; DUAN XIANGFENG ; LIU CHAO</creatorcontrib><description>Methods for forming or patterning nanostructure arrays are provided. The methods involve formation of arrays on coatings comprising nanostructure association groups, formation of arrays in spin-on-dielectrics, solvent annealing after nanostructure deposition, patterning using resist, and/or use of devices that facilitate array formation. Related devices for forming nanostructure arrays are also provided, as are devices including nanostructure arrays (e.g., memory devices).</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110210&DB=EPODOC&CC=US&NR=2011034038A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110210&DB=EPODOC&CC=US&NR=2011034038A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CRUDEN KAREN CHU</creatorcontrib><creatorcontrib>CHEN JIAN</creatorcontrib><creatorcontrib>PARCE J. WALLACE</creatorcontrib><creatorcontrib>DUAN XIANGFENG</creatorcontrib><creatorcontrib>LIU CHAO</creatorcontrib><title>Methods and devices for forming nanostructure monolayers and devices including such monolayers</title><description>Methods for forming or patterning nanostructure arrays are provided. The methods involve formation of arrays on coatings comprising nanostructure association groups, formation of arrays in spin-on-dielectrics, solvent annealing after nanostructure deposition, patterning using resist, and/or use of devices that facilitate array formation. Related devices for forming nanostructure arrays are also provided, as are devices including nanostructure arrays (e.g., memory devices).</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIjzTS3JyE8pVkjMS1FISS3LTE4tVkjLLwLh3My8dIW8xLz84pKi0uSS0qJUhdz8vPycxMrUIlQNmXnJOaUpIOXFpckZSKp4GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8aLCRgaGhgbGJgbGFo6ExcaoAnLo-XQ</recordid><startdate>20110210</startdate><enddate>20110210</enddate><creator>CRUDEN KAREN CHU</creator><creator>CHEN JIAN</creator><creator>PARCE J. WALLACE</creator><creator>DUAN XIANGFENG</creator><creator>LIU CHAO</creator><scope>EVB</scope></search><sort><creationdate>20110210</creationdate><title>Methods and devices for forming nanostructure monolayers and devices including such monolayers</title><author>CRUDEN KAREN CHU ; CHEN JIAN ; PARCE J. WALLACE ; DUAN XIANGFENG ; LIU CHAO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2011034038A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2011</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>CRUDEN KAREN CHU</creatorcontrib><creatorcontrib>CHEN JIAN</creatorcontrib><creatorcontrib>PARCE J. WALLACE</creatorcontrib><creatorcontrib>DUAN XIANGFENG</creatorcontrib><creatorcontrib>LIU CHAO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CRUDEN KAREN CHU</au><au>CHEN JIAN</au><au>PARCE J. WALLACE</au><au>DUAN XIANGFENG</au><au>LIU CHAO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Methods and devices for forming nanostructure monolayers and devices including such monolayers</title><date>2011-02-10</date><risdate>2011</risdate><abstract>Methods for forming or patterning nanostructure arrays are provided. The methods involve formation of arrays on coatings comprising nanostructure association groups, formation of arrays in spin-on-dielectrics, solvent annealing after nanostructure deposition, patterning using resist, and/or use of devices that facilitate array formation. Related devices for forming nanostructure arrays are also provided, as are devices including nanostructure arrays (e.g., memory devices).</abstract><oa>free_for_read</oa></addata></record>
fulltext	fulltext_linktorsrc
identifier
ispartof
issn
language	eng
recordid	cdi_epo_espacenet_US2011034038A1
source	esp@cenet
subjects	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
title	Methods and devices for forming nanostructure monolayers and devices including such monolayers
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-27T00%3A25%3A43IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=CRUDEN%20KAREN%20CHU&rft.date=2011-02-10&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2011034038A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true