Apparatus and Method for Plasma-Assisted Coating and Surface Treatment of Voluminous Parts

Disclosed are an apparatus and a method for plasma-supported coating and surface treatment of voluminous parts. The apparatus features a vacuum chamber (3, 20, 32) comprising one or more pumps, a first resonant circuit with a first high frequency generator (5, 17, 28, 40), with an adjustable capacit...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	LAURE STEFAN
Format:	Patent
Sprache:	eng
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

container_end_page
container_issue
container_start_page
container_title
container_volume
creator	LAURE STEFAN
description	Disclosed are an apparatus and a method for plasma-supported coating and surface treatment of voluminous parts. The apparatus features a vacuum chamber (3, 20, 32) comprising one or more pumps, a first resonant circuit with a first high frequency generator (5, 17, 28, 40), with an adjustable capacitance and an adjustable inductance of the first resonant circuit, and a first connection for integrating the part (1, 21, 32, 39) into the first resonant circuit, with at least a second resonant circuit with a second high frequency generator (18, 29, 40), with a second connector for integrating the part (1, 21, 32, 39) into the second resonant circuit and an adjustable capacitance and an adjustable inductance of the second resonant circuit. According to the disclosed method the inductance and/or the capacitance of the first and second resonant circuits are determined based on the part (1, 21, 31, 39).
format	Patent
fullrecord	<record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2010323126A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2010323126A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2010323126A13</originalsourceid><addsrcrecordid>eNqNzLEKwjAQgOEuDqK-w4FzoWnBvRTFRSi0OriUw15qoM2F3OX9LeIDOP3Lx7_NnnUIGFGTAPoRbqRvHsFyhHZGWTCvRZwojdAwqvPTl3UpWnwR9JFQF_IKbOHBc1qc53XVYlTZZxuLs9Dh1112vJz75ppT4IEkrANPOty7sjBFVVamPNWm-k99AMI4O2k</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Apparatus and Method for Plasma-Assisted Coating and Surface Treatment of Voluminous Parts</title><source>esp@cenet</source><creator>LAURE STEFAN</creator><creatorcontrib>LAURE STEFAN</creatorcontrib><description>Disclosed are an apparatus and a method for plasma-supported coating and surface treatment of voluminous parts. The apparatus features a vacuum chamber (3, 20, 32) comprising one or more pumps, a first resonant circuit with a first high frequency generator (5, 17, 28, 40), with an adjustable capacitance and an adjustable inductance of the first resonant circuit, and a first connection for integrating the part (1, 21, 32, 39) into the first resonant circuit, with at least a second resonant circuit with a second high frequency generator (18, 29, 40), with a second connector for integrating the part (1, 21, 32, 39) into the second resonant circuit and an adjustable capacitance and an adjustable inductance of the second resonant circuit. According to the disclosed method the inductance and/or the capacitance of the first and second resonant circuits are determined based on the part (1, 21, 31, 39).</description><language>eng</language><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20101223&DB=EPODOC&CC=US&NR=2010323126A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20101223&DB=EPODOC&CC=US&NR=2010323126A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LAURE STEFAN</creatorcontrib><title>Apparatus and Method for Plasma-Assisted Coating and Surface Treatment of Voluminous Parts</title><description>Disclosed are an apparatus and a method for plasma-supported coating and surface treatment of voluminous parts. The apparatus features a vacuum chamber (3, 20, 32) comprising one or more pumps, a first resonant circuit with a first high frequency generator (5, 17, 28, 40), with an adjustable capacitance and an adjustable inductance of the first resonant circuit, and a first connection for integrating the part (1, 21, 32, 39) into the first resonant circuit, with at least a second resonant circuit with a second high frequency generator (18, 29, 40), with a second connector for integrating the part (1, 21, 32, 39) into the second resonant circuit and an adjustable capacitance and an adjustable inductance of the second resonant circuit. According to the disclosed method the inductance and/or the capacitance of the first and second resonant circuits are determined based on the part (1, 21, 31, 39).</description><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNzLEKwjAQgOEuDqK-w4FzoWnBvRTFRSi0OriUw15qoM2F3OX9LeIDOP3Lx7_NnnUIGFGTAPoRbqRvHsFyhHZGWTCvRZwojdAwqvPTl3UpWnwR9JFQF_IKbOHBc1qc53XVYlTZZxuLs9Dh1112vJz75ppT4IEkrANPOty7sjBFVVamPNWm-k99AMI4O2k</recordid><startdate>20101223</startdate><enddate>20101223</enddate><creator>LAURE STEFAN</creator><scope>EVB</scope></search><sort><creationdate>20101223</creationdate><title>Apparatus and Method for Plasma-Assisted Coating and Surface Treatment of Voluminous Parts</title><author>LAURE STEFAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2010323126A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2010</creationdate><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><toplevel>online_resources</toplevel><creatorcontrib>LAURE STEFAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LAURE STEFAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Apparatus and Method for Plasma-Assisted Coating and Surface Treatment of Voluminous Parts</title><date>2010-12-23</date><risdate>2010</risdate><abstract>Disclosed are an apparatus and a method for plasma-supported coating and surface treatment of voluminous parts. The apparatus features a vacuum chamber (3, 20, 32) comprising one or more pumps, a first resonant circuit with a first high frequency generator (5, 17, 28, 40), with an adjustable capacitance and an adjustable inductance of the first resonant circuit, and a first connection for integrating the part (1, 21, 32, 39) into the first resonant circuit, with at least a second resonant circuit with a second high frequency generator (18, 29, 40), with a second connector for integrating the part (1, 21, 32, 39) into the second resonant circuit and an adjustable capacitance and an adjustable inductance of the second resonant circuit. According to the disclosed method the inductance and/or the capacitance of the first and second resonant circuits are determined based on the part (1, 21, 31, 39).</abstract><oa>free_for_read</oa></addata></record>
fulltext	fulltext_linktorsrc
identifier
ispartof
issn
language	eng
recordid	cdi_epo_espacenet_US2010323126A1
source	esp@cenet
subjects	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
title	Apparatus and Method for Plasma-Assisted Coating and Surface Treatment of Voluminous Parts
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-13T21%3A07%3A16IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=LAURE%20STEFAN&rft.date=2010-12-23&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2010323126A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true