IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
An immersion lithographic apparatus has a surface that in use is contacted by the immersion liquid and the surface has a surface roughness Ra that is less than or equal to 0.2 μm. Immersion liquid on the surface may have a contact angle of 60° or greater. The surface may be able to maintain its prop...
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| creator | ELISSEEVA OLGA VLADIMIROVNA DZIOMKINA NINA VLADIMIROVNA |
| description | An immersion lithographic apparatus has a surface that in use is contacted by the immersion liquid and the surface has a surface roughness Ra that is less than or equal to 0.2 μm. Immersion liquid on the surface may have a contact angle of 60° or greater. The surface may be able to maintain its properties so that immersion liquid on the surface may have the contact angle for a prolonged period of immersion in the immersion liquid. |
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Immersion liquid on the surface may have a contact angle of 60° or greater. The surface may be able to maintain its properties so that immersion liquid on the surface may have the contact angle for a prolonged period of immersion in the immersion liquid.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD |
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