Systems, methods and solutions for chemical polishing of GaAs wafers

Chemical polishing solutions and methods are disclosed for the chemical polishing of GaAs wafers. An exemplary chemical polishing solution consistent with the innovations herein may comprise dichloroisocyanurate, sulfonate, acid pyrophosphate, bicarbonate and carbonate. An exemplary chemical polishi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KAIXIE TAN, YAN GU, YUANLI WANG
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMISTRY DYES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES
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