Polyurethane Roller with Reduced Surface Resistance

Polyurethane Roller with Reduced Surface Resistance

The present disclosure relates to an image forming component. The component may include a urethane body, comprising polydiene containing a residual double bond available for oxidation, and including a surface, wherein said double bond is oxidized. The component may also include a first conductive ad...

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Hauptverfasser: ROE RONALD LLOYD, KILLEEN KELLY ANN, BEACH BRADLEY LEONARD
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
CABLES
CONDUCTORS
ELECTRICITY
INSULATORS
PERFORMING OPERATIONS
SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES
SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG, OR MIXTURESCONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
TRANSPORTING
WORKING CEMENT, CLAY, OR STONE
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creator ROE RONALD LLOYD
KILLEEN KELLY ANN
BEACH BRADLEY LEONARD
description The present disclosure relates to an image forming component. The component may include a urethane body, comprising polydiene containing a residual double bond available for oxidation, and including a surface, wherein said double bond is oxidized. The component may also include a first conductive additive including an alkali metal salt, wherein the first conductive additive catalyzes the oxidation of the polydiene and a second conductive additive including an inert conductive additive that does not catalyze the polydiene oxidation, wherein the image forming component exhibits a surface resistivity in the range of 1.0×109 to 1.0×1012 ohm-cm, when characterized at 15.6° C. and 20% RH.
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The component may include a urethane body, comprising polydiene containing a residual double bond available for oxidation, and including a surface, wherein said double bond is oxidized. The component may also include a first conductive additive including an alkali metal salt, wherein the first conductive additive catalyzes the oxidation of the polydiene and a second conductive additive including an inert conductive additive that does not catalyze the polydiene oxidation, wherein the image forming component exhibits a surface resistivity in the range of 1.0×109 to 1.0×1012 ohm-cm, when characterized at 15.6° C. and 20% RH.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CABLES ; CONDUCTORS ; ELECTRICITY ; INSULATORS ; PERFORMING OPERATIONS ; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES ; SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG, OR MIXTURESCONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER ; TRANSPORTING ; WORKING CEMENT, CLAY, OR STONE</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20100624&amp;DB=EPODOC&amp;CC=US&amp;NR=2010155677A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20100624&amp;DB=EPODOC&amp;CC=US&amp;NR=2010155677A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ROE RONALD LLOYD</creatorcontrib><creatorcontrib>KILLEEN KELLY ANN</creatorcontrib><creatorcontrib>BEACH BRADLEY LEONARD</creatorcontrib><title>Polyurethane Roller with Reduced Surface Resistance</title><description>The present disclosure relates to an image forming component. 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subjects BASIC ELECTRIC ELEMENTS
CABLES
CONDUCTORS
ELECTRICITY
INSULATORS
PERFORMING OPERATIONS
SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES
SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG, OR MIXTURESCONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
TRANSPORTING
WORKING CEMENT, CLAY, OR STONE
title Polyurethane Roller with Reduced Surface Resistance
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