ATOMIC LAYER DEPOSITION PROCESS FOR MANUFACTURE OF BATTERY ELECTRODES, CAPACITORS, RESISTORS, AND CATALYZERS

The present disclosure relates generally to the field of sequential surface chemistry. More specifically, it relates to products and methods for manufacturing products using Atomic Layer Deposition ("ALD") to depose one or more materials onto a surface. ALD is an emerging variant of Chemic...

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1. Verfasser: LAOR HERZEL
Format: Patent
Sprache:eng
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