Lithographic projection system and projection lens polarization sensor

A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the man...

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Bibliographische Detailangaben
Hauptverfasser:	GILING ERWIN JOHANNES MARTINUS, KLAASSEN MICHEL FRANSOIS HUBERT, VAN DE KERKHOF MARCUS ADRIANUS, KUIPER JOHANNES MARIA, ROOIJAKKERS WILHELMUS JACOBUS MARIA, SONNEVELD JACOB, VAN DOOREN LEON, UITTERDIJK TAMMO, DE BOEIJ WILHELMUS PETRUS, KOK HAICO VICTOR, VAN GREEVENBROEK HENDRIKUS ROBERTUS MARIE, WEHRENS MARTIJN GERARD DOMINIQUE
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY COLORIMETRY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RADIATION PYROMETRY TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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