Displacement Measurement Systems, Lithographic Apparatus, and Device Manufacturing Method

A displacement measurement system configured to provide measurement of the relative displacement of two components in six degrees of freedom with improved consistency and without requiring excessive space.

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Bibliographische Detailangaben
Hauptverfasser:	LOOPSTRA ERIK ROELOF, VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS, KLAVER RENATUS GERARDUS
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHOTOGRAPHY PHYSICS TESTING
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