FABRICATION PROCESS FOR SILICON RIDGE WAVEGUIDE RING RESONATOR

An embodiment of a method for manufacturing an optical ring resonator device is disclosed. The method forms a ring resonator waveguide on a semiconductor substrate, forms an unoriented electro-optic polymer cladding over the ring resonator waveguide, and forms electrodes on the semiconductor substra...

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Hauptverfasser: KRUG WILLIAM P, KOSHINZ DENNIS G, HOCHBERG MICHAEL, TAKAYESU JOCELYN Y, NIELSEN JEAN A
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creator KRUG WILLIAM P
KOSHINZ DENNIS G
HOCHBERG MICHAEL
TAKAYESU JOCELYN Y
NIELSEN JEAN A
description An embodiment of a method for manufacturing an optical ring resonator device is disclosed. The method forms a ring resonator waveguide on a semiconductor substrate, forms an unoriented electro-optic polymer cladding over the ring resonator waveguide, and forms electrodes on the semiconductor substrate. The unoriented electro-optic polymer cladding is configured to change orientation under an applied electric field, and the electrodes are coupled to the optical ring resonator for manipulation of the electric field applied to the oriented electro-optic polymer cladding for rapid voltage tuning of its index.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2010015741A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2010015741A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2010015741A13</originalsourceid><addsrcrecordid>eNrjZLBzc3QK8nR2DPH091MICPJ3dg0OVnDzD1II9vTxdAaKBXm6uLsqhDuGubqHerq4Avl-7gpBrsH-fo4h_kE8DKxpiTnFqbxQmptB2c01xNlDN7UgPz61uCAxOTUvtSQ-NNjIwNDAwNDU3MTQ0dCYOFUAC04rFQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>FABRICATION PROCESS FOR SILICON RIDGE WAVEGUIDE RING RESONATOR</title><source>esp@cenet</source><creator>KRUG WILLIAM P ; KOSHINZ DENNIS G ; HOCHBERG MICHAEL ; TAKAYESU JOCELYN Y ; NIELSEN JEAN A</creator><creatorcontrib>KRUG WILLIAM P ; KOSHINZ DENNIS G ; HOCHBERG MICHAEL ; TAKAYESU JOCELYN Y ; NIELSEN JEAN A</creatorcontrib><description>An embodiment of a method for manufacturing an optical ring resonator device is disclosed. The method forms a ring resonator waveguide on a semiconductor substrate, forms an unoriented electro-optic polymer cladding over the ring resonator waveguide, and forms electrodes on the semiconductor substrate. The unoriented electro-optic polymer cladding is configured to change orientation under an applied electric field, and the electrodes are coupled to the optical ring resonator for manipulation of the electric field applied to the oriented electro-optic polymer cladding for rapid voltage tuning of its index.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20100121&amp;DB=EPODOC&amp;CC=US&amp;NR=2010015741A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20100121&amp;DB=EPODOC&amp;CC=US&amp;NR=2010015741A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KRUG WILLIAM P</creatorcontrib><creatorcontrib>KOSHINZ DENNIS G</creatorcontrib><creatorcontrib>HOCHBERG MICHAEL</creatorcontrib><creatorcontrib>TAKAYESU JOCELYN Y</creatorcontrib><creatorcontrib>NIELSEN JEAN A</creatorcontrib><title>FABRICATION PROCESS FOR SILICON RIDGE WAVEGUIDE RING RESONATOR</title><description>An embodiment of a method for manufacturing an optical ring resonator device is disclosed. The method forms a ring resonator waveguide on a semiconductor substrate, forms an unoriented electro-optic polymer cladding over the ring resonator waveguide, and forms electrodes on the semiconductor substrate. The unoriented electro-optic polymer cladding is configured to change orientation under an applied electric field, and the electrodes are coupled to the optical ring resonator for manipulation of the electric field applied to the oriented electro-optic polymer cladding for rapid voltage tuning of its index.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLBzc3QK8nR2DPH091MICPJ3dg0OVnDzD1II9vTxdAaKBXm6uLsqhDuGubqHerq4Avl-7gpBrsH-fo4h_kE8DKxpiTnFqbxQmptB2c01xNlDN7UgPz61uCAxOTUvtSQ-NNjIwNDAwNDU3MTQ0dCYOFUAC04rFQ</recordid><startdate>20100121</startdate><enddate>20100121</enddate><creator>KRUG WILLIAM P</creator><creator>KOSHINZ DENNIS G</creator><creator>HOCHBERG MICHAEL</creator><creator>TAKAYESU JOCELYN Y</creator><creator>NIELSEN JEAN A</creator><scope>EVB</scope></search><sort><creationdate>20100121</creationdate><title>FABRICATION PROCESS FOR SILICON RIDGE WAVEGUIDE RING RESONATOR</title><author>KRUG WILLIAM P ; KOSHINZ DENNIS G ; HOCHBERG MICHAEL ; TAKAYESU JOCELYN Y ; NIELSEN JEAN A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2010015741A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2010</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KRUG WILLIAM P</creatorcontrib><creatorcontrib>KOSHINZ DENNIS G</creatorcontrib><creatorcontrib>HOCHBERG MICHAEL</creatorcontrib><creatorcontrib>TAKAYESU JOCELYN Y</creatorcontrib><creatorcontrib>NIELSEN JEAN A</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KRUG WILLIAM P</au><au>KOSHINZ DENNIS G</au><au>HOCHBERG MICHAEL</au><au>TAKAYESU JOCELYN Y</au><au>NIELSEN JEAN A</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>FABRICATION PROCESS FOR SILICON RIDGE WAVEGUIDE RING RESONATOR</title><date>2010-01-21</date><risdate>2010</risdate><abstract>An embodiment of a method for manufacturing an optical ring resonator device is disclosed. The method forms a ring resonator waveguide on a semiconductor substrate, forms an unoriented electro-optic polymer cladding over the ring resonator waveguide, and forms electrodes on the semiconductor substrate. The unoriented electro-optic polymer cladding is configured to change orientation under an applied electric field, and the electrodes are coupled to the optical ring resonator for manipulation of the electric field applied to the oriented electro-optic polymer cladding for rapid voltage tuning of its index.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title FABRICATION PROCESS FOR SILICON RIDGE WAVEGUIDE RING RESONATOR
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-05T19%3A09%3A11IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KRUG%20WILLIAM%20P&rft.date=2010-01-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2010015741A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true