NANOPOROUS MATERIALS AND RELATED METHODS
Nanoporous sol-gel derived monoliths and methods for making nanoporous sol-gel derived monoliths are provided. The methods enable fine control over pore size and pore size distribution, e.g., so that pore sizes can be predetermined and precisely tuned over a range from 0.3 nm to about 30 nm, or over...
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| creator | WANG SHIHO NAIR VINOD M.P SINGH JASPAL |
| description | Nanoporous sol-gel derived monoliths and methods for making nanoporous sol-gel derived monoliths are provided. The methods enable fine control over pore size and pore size distribution, e.g., so that pore sizes can be predetermined and precisely tuned over a range from 0.3 nm to about 30 nm, or over a range from about 0.3 nm to about 10 nm. The monoliths may be derived from any suitable sol-gel, but in some instances they are derived from silica sol-gels. The sol-gel derived monoliths with finely tunable pore sizes and narrow pore size distributions may be used for a variety of applications, e.g., as substrates or templates for high surface area electrodes, as substrates for high surface area sensor, or as a component in a filtration apparatus. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2009305026A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2009305026A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2009305026A13</originalsourceid><addsrcrecordid>eNrjZNDwc_TzD_AP8g8NVvB1DHEN8nT0CVZw9HNRCHL1AfJdFHxdQzz8XYJ5GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8aLCRgYGlsYGpgZGZo6ExcaoApzslFw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>NANOPOROUS MATERIALS AND RELATED METHODS</title><source>esp@cenet</source><creator>WANG SHIHO ; NAIR VINOD M.P ; SINGH JASPAL</creator><creatorcontrib>WANG SHIHO ; NAIR VINOD M.P ; SINGH JASPAL</creatorcontrib><description>Nanoporous sol-gel derived monoliths and methods for making nanoporous sol-gel derived monoliths are provided. The methods enable fine control over pore size and pore size distribution, e.g., so that pore sizes can be predetermined and precisely tuned over a range from 0.3 nm to about 30 nm, or over a range from about 0.3 nm to about 10 nm. The monoliths may be derived from any suitable sol-gel, but in some instances they are derived from silica sol-gels. The sol-gel derived monoliths with finely tunable pore sizes and narrow pore size distributions may be used for a variety of applications, e.g., as substrates or templates for high surface area electrodes, as substrates for high surface area sensor, or as a component in a filtration apparatus.</description><language>eng</language><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING ; BASIC ELECTRIC ELEMENTS ; CAPACITORS ; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE ; CASTING ; CHEMISTRY ; COMPOUNDS THEREOF ; ELECTRICITY ; FOUNDRY MOULDING ; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC ; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS ; INORGANIC CHEMISTRY ; LAYERED PRODUCTS ; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM ; METALLURGY ; NON-METALLIC ELEMENTS ; PERFORMING OPERATIONS ; POWDER METALLURGY ; PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY ; REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGYGENERATION, TRANSMISSION OR DISTRIBUTION ; SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG, OR MIXTURESCONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER ; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR ; SHAPING OR JOINING OF PLASTICS ; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ; TECHNICAL SUBJECTS COVERED BY FORMER USPC ; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS ; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE ; TRANSPORTING ; WORKING CEMENT, CLAY, OR STONE ; WORKING OF PLASTICS ; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20091210&DB=EPODOC&CC=US&NR=2009305026A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20091210&DB=EPODOC&CC=US&NR=2009305026A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WANG SHIHO</creatorcontrib><creatorcontrib>NAIR VINOD M.P</creatorcontrib><creatorcontrib>SINGH JASPAL</creatorcontrib><title>NANOPOROUS MATERIALS AND RELATED METHODS</title><description>Nanoporous sol-gel derived monoliths and methods for making nanoporous sol-gel derived monoliths are provided. The methods enable fine control over pore size and pore size distribution, e.g., so that pore sizes can be predetermined and precisely tuned over a range from 0.3 nm to about 30 nm, or over a range from about 0.3 nm to about 10 nm. The monoliths may be derived from any suitable sol-gel, but in some instances they are derived from silica sol-gels. The sol-gel derived monoliths with finely tunable pore sizes and narrow pore size distributions may be used for a variety of applications, e.g., as substrates or templates for high surface area electrodes, as substrates for high surface area sensor, or as a component in a filtration apparatus.</description><subject>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CAPACITORS</subject><subject>CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE</subject><subject>CASTING</subject><subject>CHEMISTRY</subject><subject>COMPOUNDS THEREOF</subject><subject>ELECTRICITY</subject><subject>FOUNDRY MOULDING</subject><subject>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</subject><subject>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</subject><subject>INORGANIC CHEMISTRY</subject><subject>LAYERED PRODUCTS</subject><subject>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</subject><subject>METALLURGY</subject><subject>NON-METALLIC ELEMENTS</subject><subject>PERFORMING OPERATIONS</subject><subject>POWDER METALLURGY</subject><subject>PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY</subject><subject>REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGYGENERATION, TRANSMISSION OR DISTRIBUTION</subject><subject>SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG, OR MIXTURESCONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER</subject><subject>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</subject><subject>SHAPING OR JOINING OF PLASTICS</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER USPC</subject><subject>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</subject><subject>TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE</subject><subject>TRANSPORTING</subject><subject>WORKING CEMENT, CLAY, OR STONE</subject><subject>WORKING OF PLASTICS</subject><subject>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNDwc_TzD_AP8g8NVvB1DHEN8nT0CVZw9HNRCHL1AfJdFHxdQzz8XYJ5GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8aLCRgYGlsYGpgZGZo6ExcaoApzslFw</recordid><startdate>20091210</startdate><enddate>20091210</enddate><creator>WANG SHIHO</creator><creator>NAIR VINOD M.P</creator><creator>SINGH JASPAL</creator><scope>EVB</scope></search><sort><creationdate>20091210</creationdate><title>NANOPOROUS MATERIALS AND RELATED METHODS</title><author>WANG SHIHO ; NAIR VINOD M.P ; SINGH JASPAL</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2009305026A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2009</creationdate><topic>AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CAPACITORS</topic><topic>CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE</topic><topic>CASTING</topic><topic>CHEMISTRY</topic><topic>COMPOUNDS THEREOF</topic><topic>ELECTRICITY</topic><topic>FOUNDRY MOULDING</topic><topic>GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC</topic><topic>GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS</topic><topic>INORGANIC CHEMISTRY</topic><topic>LAYERED PRODUCTS</topic><topic>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</topic><topic>METALLURGY</topic><topic>NON-METALLIC ELEMENTS</topic><topic>PERFORMING OPERATIONS</topic><topic>POWDER METALLURGY</topic><topic>PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY</topic><topic>REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGYGENERATION, TRANSMISSION OR DISTRIBUTION</topic><topic>SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG, OR MIXTURESCONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER</topic><topic>SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR</topic><topic>SHAPING OR JOINING OF PLASTICS</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC</topic><topic>TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS</topic><topic>TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE</topic><topic>TRANSPORTING</topic><topic>WORKING CEMENT, CLAY, OR STONE</topic><topic>WORKING OF PLASTICS</topic><topic>WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL</topic><toplevel>online_resources</toplevel><creatorcontrib>WANG SHIHO</creatorcontrib><creatorcontrib>NAIR VINOD M.P</creatorcontrib><creatorcontrib>SINGH JASPAL</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WANG SHIHO</au><au>NAIR VINOD M.P</au><au>SINGH JASPAL</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>NANOPOROUS MATERIALS AND RELATED METHODS</title><date>2009-12-10</date><risdate>2009</risdate><abstract>Nanoporous sol-gel derived monoliths and methods for making nanoporous sol-gel derived monoliths are provided. The methods enable fine control over pore size and pore size distribution, e.g., so that pore sizes can be predetermined and precisely tuned over a range from 0.3 nm to about 30 nm, or over a range from about 0.3 nm to about 10 nm. The monoliths may be derived from any suitable sol-gel, but in some instances they are derived from silica sol-gels. The sol-gel derived monoliths with finely tunable pore sizes and narrow pore size distributions may be used for a variety of applications, e.g., as substrates or templates for high surface area electrodes, as substrates for high surface area sensor, or as a component in a filtration apparatus.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING BASIC ELECTRIC ELEMENTS CAPACITORS CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE CASTING CHEMISTRY COMPOUNDS THEREOF ELECTRICITY FOUNDRY MOULDING GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS INORGANIC CHEMISTRY LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS POWDER METALLURGY PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGYGENERATION, TRANSMISSION OR DISTRIBUTION SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG, OR MIXTURESCONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE TRANSPORTING WORKING CEMENT, CLAY, OR STONE WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL |
| title | NANOPOROUS MATERIALS AND RELATED METHODS |
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