CONTINUOUS FLUID JET EJECTOR WITH ANISOTROPICALLY ETCHED FLUID CHAMBERS

A fluid ejection device, a method of cleaning the device, and a method of operating the device are provided. The device includes a substrate having a first surface and a second surface located opposite the first surface. A nozzle plate is formed over the first surface of the substrate and has a nozz...

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Hauptverfasser: KNEEZEL GARY A, DELAMETTER CHRISTOPHER N, CHWALEK JAMES M, TRAUERNICHT DAVID P, LEBENS JOHN A
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A fluid ejection device, a method of cleaning the device, and a method of operating the device are provided. The device includes a substrate having a first surface and a second surface located opposite the first surface. A nozzle plate is formed over the first surface of the substrate and has a nozzle through which fluid is ejected. A drop forming mechanism is situated at the periphery of the nozzle. A fluid chamber is in fluid communication with the nozzle and has a first wall and a second wall. The first wall and the second wall are positioned at an angle other than 90° relative to each other. A fluid delivery channel is formed in the substrate and extends from the second surface of the substrate to the fluid chamber. The fluid delivery channel is in fluid communication with the fluid chamber.