RETICLES INCLUDING ASSISTANT STRUCTURES, METHODS OF FORMING SUCH RETICLES, AND METHODS OF UTILIZING SUCH RETICLES

RETICLES INCLUDING ASSISTANT STRUCTURES, METHODS OF FORMING SUCH RETICLES, AND METHODS OF UTILIZING SUCH RETICLES

Reticles comprising assistant structures in contact with at least sidewalls of a phase shift and transmission control material are disclosed. The assistant structures are formed from an absorptive material, such as chromium. The assistant structures provide reduced scumming defects in features produ...

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Hauptverfasser: WANG FEI, STANTON WILLIAM A
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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creator WANG FEI
STANTON WILLIAM A
description Reticles comprising assistant structures in contact with at least sidewalls of a phase shift and transmission control material are disclosed. The assistant structures are formed from an absorptive material, such as chromium. The assistant structures provide reduced scumming defects in features produced using the reticles. Methods of forming the reticles and methods of utilizing the reticles are also disclosed.
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title RETICLES INCLUDING ASSISTANT STRUCTURES, METHODS OF FORMING SUCH RETICLES, AND METHODS OF UTILIZING SUCH RETICLES
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