Methods, Systems and Structures for Forming Semiconductor Structures Incorporating High-Temperature Processing Steps

Methods, Systems and Structures for Forming Semiconductor Structures Incorporating High-Temperature Processing Steps

A method (100) of forming semiconductor structures (202) including high-temperature processing steps (step 118), incorporates the use of a high-temperature nitride-oxide mask (220) over protected regions (214) of the device (202). The invention has application in many different embodiments, includin...

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Bibliographische Detailangaben
Hauptverfasser: CHIDAMBARAM PR, BU HAOWEN, KHAMANKAR RAJESH, GRIDER DOUGLAS T
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A method (100) of forming semiconductor structures (202) including high-temperature processing steps (step 118), incorporates the use of a high-temperature nitride-oxide mask (220) over protected regions (214) of the device (202). The invention has application in many different embodiments, including but not limited to, the formation of recess, strained device regions (224).