REDUCING INTRODUCTION OF FOREIGN MATERIAL TO WAFERS

REDUCING INTRODUCTION OF FOREIGN MATERIAL TO WAFERS

A system and method of reducing the introduction of foreign material to wafers. A system includes an enclosure structured and arranged to carry wafers used in semiconductor device manufacturing, and an attractive material arranged as at least a portion of an interior surface of the enclosure.

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Hauptverfasser: EASTON ALISON K, FLUEGEL JAMES E, PETERMAN JAMES H, CLARK DAVID J
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator EASTON ALISON K
FLUEGEL JAMES E
PETERMAN JAMES H
CLARK DAVID J
description A system and method of reducing the introduction of foreign material to wafers. A system includes an enclosure structured and arranged to carry wafers used in semiconductor device manufacturing, and an attractive material arranged as at least a portion of an interior surface of the enclosure.
format Patent
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title REDUCING INTRODUCTION OF FOREIGN MATERIAL TO WAFERS
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