Photosensitive Resin Composition, and Photosensitive Film and Stencil for Screen Printing Using the Photosensitive Composition

This invention relates to a photosensitive composition characterized by comprising components A, B and C, and a photosensitive film and a stencil for screen printing using the photosensitive composition; Component A: a poly(vinyl alcohol) polymer represented by formula (1) or (2) wherein R1 represen...

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Hauptverfasser: HOTTA CHIEKO, ICHIMURA KUNIHIRO, NAGABUCHI ERI, KAWANOBE JUNICHI
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creator HOTTA CHIEKO
ICHIMURA KUNIHIRO
NAGABUCHI ERI
KAWANOBE JUNICHI
description This invention relates to a photosensitive composition characterized by comprising components A, B and C, and a photosensitive film and a stencil for screen printing using the photosensitive composition; Component A: a poly(vinyl alcohol) polymer represented by formula (1) or (2) wherein R1 represents a hydrogen atom, an alkyl or aralkyl group having 1 to 10 carbon atoms, wherein the alkyl and aralkyl groups may be substituted by a hydroxyl or carbamoyl group and the bond between carbon atoms thereof may be present through an oxygen atom or an unsaturated bond; R2 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; m is an integer of 1 to 6; n is 0 or 1; and X- represents a halogen ion, a phosphate ion, a methosulfate ion, or a sulfonate ion, or a mixture of the anions; component B: a radical polymerizable monomer containing at least one ethylenically unsaturated bond and possesses an anion dissociating capability; and component C: a radical photoinitiator.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2009099275A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2009099275A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2009099275A13</originalsourceid><addsrcrecordid>eNrjZKgLyMgvyS9OzSvOLMksS1UISi3OzFNwzs8tyAeJ5OfpKCTmpSigqXLLzMkFiweXpOYlZ-YopOUXKQQnF6Wm5ikEFGXmlWTmpSuEFoPIkoxUdN1IpvMwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUkvjQYCMDA0sDS0sjc1NHQ2PiVAEAFnFKKQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Photosensitive Resin Composition, and Photosensitive Film and Stencil for Screen Printing Using the Photosensitive Composition</title><source>esp@cenet</source><creator>HOTTA CHIEKO ; ICHIMURA KUNIHIRO ; NAGABUCHI ERI ; KAWANOBE JUNICHI</creator><creatorcontrib>HOTTA CHIEKO ; ICHIMURA KUNIHIRO ; NAGABUCHI ERI ; KAWANOBE JUNICHI</creatorcontrib><description>This invention relates to a photosensitive composition characterized by comprising components A, B and C, and a photosensitive film and a stencil for screen printing using the photosensitive composition; Component A: a poly(vinyl alcohol) polymer represented by formula (1) or (2) wherein R1 represents a hydrogen atom, an alkyl or aralkyl group having 1 to 10 carbon atoms, wherein the alkyl and aralkyl groups may be substituted by a hydroxyl or carbamoyl group and the bond between carbon atoms thereof may be present through an oxygen atom or an unsaturated bond; R2 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; m is an integer of 1 to 6; n is 0 or 1; and X- represents a halogen ion, a phosphate ion, a methosulfate ion, or a sulfonate ion, or a mixture of the anions; component B: a radical polymerizable monomer containing at least one ethylenically unsaturated bond and possesses an anion dissociating capability; and component C: a radical photoinitiator.</description><language>eng</language><subject>ADHESIVES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; CINEMATOGRAPHY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; COMPOSITIONS BASED THEREON ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; CORRECTING FLUIDS ; DYES ; ELECTROGRAPHY ; FILLING PASTES ; HOLOGRAPHY ; INKS ; MATERIALS THEREFOR ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; POLISHES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20090416&amp;DB=EPODOC&amp;CC=US&amp;NR=2009099275A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20090416&amp;DB=EPODOC&amp;CC=US&amp;NR=2009099275A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HOTTA CHIEKO</creatorcontrib><creatorcontrib>ICHIMURA KUNIHIRO</creatorcontrib><creatorcontrib>NAGABUCHI ERI</creatorcontrib><creatorcontrib>KAWANOBE JUNICHI</creatorcontrib><title>Photosensitive Resin Composition, and Photosensitive Film and Stencil for Screen Printing Using the Photosensitive Composition</title><description>This invention relates to a photosensitive composition characterized by comprising components A, B and C, and a photosensitive film and a stencil for screen printing using the photosensitive composition; Component A: a poly(vinyl alcohol) polymer represented by formula (1) or (2) wherein R1 represents a hydrogen atom, an alkyl or aralkyl group having 1 to 10 carbon atoms, wherein the alkyl and aralkyl groups may be substituted by a hydroxyl or carbamoyl group and the bond between carbon atoms thereof may be present through an oxygen atom or an unsaturated bond; R2 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; m is an integer of 1 to 6; n is 0 or 1; and X- represents a halogen ion, a phosphate ion, a methosulfate ion, or a sulfonate ion, or a mixture of the anions; component B: a radical polymerizable monomer containing at least one ethylenically unsaturated bond and possesses an anion dissociating capability; and component C: a radical photoinitiator.</description><subject>ADHESIVES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>ELECTROGRAPHY</subject><subject>FILLING PASTES</subject><subject>HOLOGRAPHY</subject><subject>INKS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZKgLyMgvyS9OzSvOLMksS1UISi3OzFNwzs8tyAeJ5OfpKCTmpSigqXLLzMkFiweXpOYlZ-YopOUXKQQnF6Wm5ikEFGXmlWTmpSuEFoPIkoxUdN1IpvMwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUkvjQYCMDA0sDS0sjc1NHQ2PiVAEAFnFKKQ</recordid><startdate>20090416</startdate><enddate>20090416</enddate><creator>HOTTA CHIEKO</creator><creator>ICHIMURA KUNIHIRO</creator><creator>NAGABUCHI ERI</creator><creator>KAWANOBE JUNICHI</creator><scope>EVB</scope></search><sort><creationdate>20090416</creationdate><title>Photosensitive Resin Composition, and Photosensitive Film and Stencil for Screen Printing Using the Photosensitive Composition</title><author>HOTTA CHIEKO ; ICHIMURA KUNIHIRO ; NAGABUCHI ERI ; KAWANOBE JUNICHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2009099275A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2009</creationdate><topic>ADHESIVES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>ELECTROGRAPHY</topic><topic>FILLING PASTES</topic><topic>HOLOGRAPHY</topic><topic>INKS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>HOTTA CHIEKO</creatorcontrib><creatorcontrib>ICHIMURA KUNIHIRO</creatorcontrib><creatorcontrib>NAGABUCHI ERI</creatorcontrib><creatorcontrib>KAWANOBE JUNICHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HOTTA CHIEKO</au><au>ICHIMURA KUNIHIRO</au><au>NAGABUCHI ERI</au><au>KAWANOBE JUNICHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Photosensitive Resin Composition, and Photosensitive Film and Stencil for Screen Printing Using the Photosensitive Composition</title><date>2009-04-16</date><risdate>2009</risdate><abstract>This invention relates to a photosensitive composition characterized by comprising components A, B and C, and a photosensitive film and a stencil for screen printing using the photosensitive composition; Component A: a poly(vinyl alcohol) polymer represented by formula (1) or (2) wherein R1 represents a hydrogen atom, an alkyl or aralkyl group having 1 to 10 carbon atoms, wherein the alkyl and aralkyl groups may be substituted by a hydroxyl or carbamoyl group and the bond between carbon atoms thereof may be present through an oxygen atom or an unsaturated bond; R2 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; m is an integer of 1 to 6; n is 0 or 1; and X- represents a halogen ion, a phosphate ion, a methosulfate ion, or a sulfonate ion, or a mixture of the anions; component B: a radical polymerizable monomer containing at least one ethylenically unsaturated bond and possesses an anion dissociating capability; and component C: a radical photoinitiator.</abstract><oa>free_for_read</oa></addata></record>
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recordid cdi_epo_espacenet_US2009099275A1
source esp@cenet
subjects ADHESIVES
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
CINEMATOGRAPHY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
CORRECTING FLUIDS
DYES
ELECTROGRAPHY
FILLING PASTES
HOLOGRAPHY
INKS
MATERIALS THEREFOR
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
POLISHES
THEIR PREPARATION OR CHEMICAL WORKING-UP
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
USE OF MATERIALS THEREFOR
WOODSTAINS
title Photosensitive Resin Composition, and Photosensitive Film and Stencil for Screen Printing Using the Photosensitive Composition
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-30T00%3A09%3A22IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HOTTA%20CHIEKO&rft.date=2009-04-16&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2009099275A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true