Immersion lithography laser light source with pulse stretcher

An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively conne...

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Bibliographische Detailangaben

Hauptverfasser:	FOMENKOV IGOR V, PARTLO WILLIAM N, ERSHOV ALEXANDER I, DANIELEWICZ ED, FLEUROV VLADIMIR B, BERGSTEDT ROBERT A, CROSBY WALTER, FITZGERALD JOHN, SWAIN ROBIN, JACQUES ROBERT N, RAO RAJASEKHAR M, BROWN DANIEL J.W, SANDSTROM RICHARD L, RYLOV GERMAN, WITTAK CHRISTIAN J, ARRIOLA EDWARD, WYATT MIKE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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