CLUSTER TOOL ARCHITECTURE FOR PROCESSING A SUBSTRATE

Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and als...

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Hauptverfasser: HERCHEN HARALD, ARMER HELEN R, BACKER JOHN A, ISHIKAWA TETSUYA, LOWRANCE ROBERT, HUDGENS JEFFREY, PINSON JAY D, WANG CHONGYANG, CARLSON CHARLES, ROBERTS RICK J, RICE MICHAEL, QUACH DAVID H, LU BRIAN, WEAVER WILLIAM TYLER, SALEK MOHSEN S, VOLFOVSKI LEON
Format: Patent
Sprache:eng
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