AIR GAP IN INTEGRATED CIRCUIT INDUCTOR FABRICATION

In accordance with the invention, there are inductors with an air gap, semiconductor devices, integrated circuits, and methods of fabricating them. The method of making an inductor with an air gap can include fabricating a first level of inductor in an intra-metal dielectric layer including one or m...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	RAO SATYAVOLU SRINIVAS PAPA, MATZ PHILLIP D, GRUNOW STEPHAN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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