Method for Mask Inspection for Mask Design and Mask Production

The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to said method for mask inspection, an aerial image simulation, preferably an all-over aerial image simulatio...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SCHMOELLER THOMAS, BOEHM KLAUS, ZIBOLD AXEL, HARNISCH WOLFGANG, KALUS CHRISTIAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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