MICRO-ELECTROMECHANICAL DEVICE AND MANUFACTURING METHOD THEREOF

A micro-electromechanical device includes a substrate, a first patterned conductive layer, a second patterned conductive layer and a first patterned blocking layer. The first patterned conductive layer is disposed on the substrate. The second patterned conductive layer is disposed on the first patte...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHEN HUANG-KUN, LEE CHENGANG, SHING TAI-KANG, HSIEH HSIEH-SHEN, WANG HORNG-JOU, LIANG CHAO-JUI, YUAN ZONG-TING
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MICROSTRUCTURAL TECHNOLOGY PERFORMING OPERATIONS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS SEMICONDUCTOR DEVICES TRANSPORTING
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