Calibration method for a lithographic apparatus

Method to calibrate a substrate table position in a lithographic apparatus includes providing a substrate on the substrate table with a two dimensional arrangement of patterns; positioning the substrate table with a positioning system; measuring positions of the substrate table in at least two dimen...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: VAN ZON ALEX, SCHOORMANS CAROLUS JOHANNES CATHARINA, ADRIAENS JOHANNES MATHIAS THEODORUS ANTONIUS
Format: Patent
Sprache:eng
Schlagworte:
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