INTEGRATION OF THIN FILM RESISTORS HAVING DIFFERENT TCRs INTO SINGLE DIE
An integrated circuit structure including multiple thin film resistors having different sheet resistances and TCRs includes a first oxide layer ( 2 ) formed on a semiconductor substrate ( 1 ), a first thin film resistor ( 3 ) disposed on the first oxide layer ( 2 ), and a second oxide layer ( 14 ) d...
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creator | BEACH ERIC W |
description | An integrated circuit structure including multiple thin film resistors having different sheet resistances and TCRs includes a first oxide layer ( 2 ) formed on a semiconductor substrate ( 1 ), a first thin film resistor ( 3 ) disposed on the first oxide layer ( 2 ), and a second oxide layer ( 14 ) disposed over the first oxide layer ( 2 ) and first thin film resistor ( 3 ). A second thin film resistor ( 15 ) is formed on the second oxide layer ( 14 ) and a third oxide layer ( 16 ) is formed over the second thin film resistor ( 15 ) and the second oxide layer ( 14 ). Interconnect metallization elements ( 12 A,B & 22 A,B) disposed on at least one of the second ( 14 ) and third ( 16 ) oxide layers electrically contact the circuit element ( 4 ), terminals of the first thin film resistor ( 3 ), and terminals of the second thin film resistor ( 15 ), respectively, through corresponding contact openings through at least one of the second ( 14 ) and third ( 16 ) oxide layers. |
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A second thin film resistor ( 15 ) is formed on the second oxide layer ( 14 ) and a third oxide layer ( 16 ) is formed over the second thin film resistor ( 15 ) and the second oxide layer ( 14 ). Interconnect metallization elements ( 12 A,B & 22 A,B) disposed on at least one of the second ( 14 ) and third ( 16 ) oxide layers electrically contact the circuit element ( 4 ), terminals of the first thin film resistor ( 3 ), and terminals of the second thin film resistor ( 15 ), respectively, through corresponding contact openings through at least one of the second ( 14 ) and third ( 16 ) oxide layers.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; RESISTORS ; SEMICONDUCTOR DEVICES</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080605&DB=EPODOC&CC=US&NR=2008132056A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080605&DB=EPODOC&CC=US&NR=2008132056A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BEACH ERIC W</creatorcontrib><title>INTEGRATION OF THIN FILM RESISTORS HAVING DIFFERENT TCRs INTO SINGLE DIE</title><description>An integrated circuit structure including multiple thin film resistors having different sheet resistances and TCRs includes a first oxide layer ( 2 ) formed on a semiconductor substrate ( 1 ), a first thin film resistor ( 3 ) disposed on the first oxide layer ( 2 ), and a second oxide layer ( 14 ) disposed over the first oxide layer ( 2 ) and first thin film resistor ( 3 ). A second thin film resistor ( 15 ) is formed on the second oxide layer ( 14 ) and a third oxide layer ( 16 ) is formed over the second thin film resistor ( 15 ) and the second oxide layer ( 14 ). Interconnect metallization elements ( 12 A,B & 22 A,B) disposed on at least one of the second ( 14 ) and third ( 16 ) oxide layers electrically contact the circuit element ( 4 ), terminals of the first thin film resistor ( 3 ), and terminals of the second thin film resistor ( 15 ), respectively, through corresponding contact openings through at least one of the second ( 14 ) and third ( 16 ) oxide layers.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>RESISTORS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPDw9AtxdQ9yDPH091Pwd1MIAQoouHn6-CoEuQZ7Bof4BwUreDiGefq5K7h4urm5Brn6hSiEOAcVKwA1-isEAyV8XIFSrjwMrGmJOcWpvFCam0HZzTXE2UM3tSA_PrW4IDE5NS-1JD402MjAwMLQ2MjA1MzR0Jg4VQDKES3Z</recordid><startdate>20080605</startdate><enddate>20080605</enddate><creator>BEACH ERIC W</creator><scope>EVB</scope></search><sort><creationdate>20080605</creationdate><title>INTEGRATION OF THIN FILM RESISTORS HAVING DIFFERENT TCRs INTO SINGLE DIE</title><author>BEACH ERIC W</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2008132056A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>RESISTORS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>BEACH ERIC W</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BEACH ERIC W</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>INTEGRATION OF THIN FILM RESISTORS HAVING DIFFERENT TCRs INTO SINGLE DIE</title><date>2008-06-05</date><risdate>2008</risdate><abstract>An integrated circuit structure including multiple thin film resistors having different sheet resistances and TCRs includes a first oxide layer ( 2 ) formed on a semiconductor substrate ( 1 ), a first thin film resistor ( 3 ) disposed on the first oxide layer ( 2 ), and a second oxide layer ( 14 ) disposed over the first oxide layer ( 2 ) and first thin film resistor ( 3 ). A second thin film resistor ( 15 ) is formed on the second oxide layer ( 14 ) and a third oxide layer ( 16 ) is formed over the second thin film resistor ( 15 ) and the second oxide layer ( 14 ). Interconnect metallization elements ( 12 A,B & 22 A,B) disposed on at least one of the second ( 14 ) and third ( 16 ) oxide layers electrically contact the circuit element ( 4 ), terminals of the first thin film resistor ( 3 ), and terminals of the second thin film resistor ( 15 ), respectively, through corresponding contact openings through at least one of the second ( 14 ) and third ( 16 ) oxide layers.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY RESISTORS SEMICONDUCTOR DEVICES |
title | INTEGRATION OF THIN FILM RESISTORS HAVING DIFFERENT TCRs INTO SINGLE DIE |
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