Mask position detection

Mask position detection

A system includes a transfer arm defining a retaining plane, and at least three sensors are disposed on the transfer arm and configured to detect a position of a mask relative to the retaining plane. The at least three sensors may be used to determine if the mask is properly positioned on the transf...

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Hauptverfasser: MCLANE JAMES R, TEODORCZYK CHARLES A, POITRAS ROBERT ANDREW
Format: Patent
Sprache:eng
Schlagworte:
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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creator MCLANE JAMES R
TEODORCZYK CHARLES A
POITRAS ROBERT ANDREW
description A system includes a transfer arm defining a retaining plane, and at least three sensors are disposed on the transfer arm and configured to detect a position of a mask relative to the retaining plane. The at least three sensors may be used to determine if the mask is properly positioned on the transfer arm and to determine if the mask is properly positioned in a masking position. The mask may be used in an ion implanter to shield portions of a workpiece from ion implantation.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2008073569A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2008073569A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2008073569A13</originalsourceid><addsrcrecordid>eNrjZBD3TSzOVijIL84syczPU0hJLUlNBrF4GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8aLCRgYGFgbmxqZmlo6ExcaoAXgcjAg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Mask position detection</title><source>esp@cenet</source><creator>MCLANE JAMES R ; TEODORCZYK CHARLES A ; POITRAS ROBERT ANDREW</creator><creatorcontrib>MCLANE JAMES R ; TEODORCZYK CHARLES A ; POITRAS ROBERT ANDREW</creatorcontrib><description>A system includes a transfer arm defining a retaining plane, and at least three sensors are disposed on the transfer arm and configured to detect a position of a mask relative to the retaining plane. The at least three sensors may be used to determine if the mask is properly positioned on the transfer arm and to determine if the mask is properly positioned in a masking position. The mask may be used in an ion implanter to shield portions of a workpiece from ion implantation.</description><language>eng</language><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; PHYSICS ; TESTING</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080327&amp;DB=EPODOC&amp;CC=US&amp;NR=2008073569A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080327&amp;DB=EPODOC&amp;CC=US&amp;NR=2008073569A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MCLANE JAMES R</creatorcontrib><creatorcontrib>TEODORCZYK CHARLES A</creatorcontrib><creatorcontrib>POITRAS ROBERT ANDREW</creatorcontrib><title>Mask position detection</title><description>A system includes a transfer arm defining a retaining plane, and at least three sensors are disposed on the transfer arm and configured to detect a position of a mask relative to the retaining plane. The at least three sensors may be used to determine if the mask is properly positioned on the transfer arm and to determine if the mask is properly positioned in a masking position. The mask may be used in an ion implanter to shield portions of a workpiece from ion implantation.</description><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBD3TSzOVijIL84syczPU0hJLUlNBrF4GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8aLCRgYGFgbmxqZmlo6ExcaoAXgcjAg</recordid><startdate>20080327</startdate><enddate>20080327</enddate><creator>MCLANE JAMES R</creator><creator>TEODORCZYK CHARLES A</creator><creator>POITRAS ROBERT ANDREW</creator><scope>EVB</scope></search><sort><creationdate>20080327</creationdate><title>Mask position detection</title><author>MCLANE JAMES R ; TEODORCZYK CHARLES A ; POITRAS ROBERT ANDREW</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2008073569A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>MCLANE JAMES R</creatorcontrib><creatorcontrib>TEODORCZYK CHARLES A</creatorcontrib><creatorcontrib>POITRAS ROBERT ANDREW</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MCLANE JAMES R</au><au>TEODORCZYK CHARLES A</au><au>POITRAS ROBERT ANDREW</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Mask position detection</title><date>2008-03-27</date><risdate>2008</risdate><abstract>A system includes a transfer arm defining a retaining plane, and at least three sensors are disposed on the transfer arm and configured to detect a position of a mask relative to the retaining plane. The at least three sensors may be used to determine if the mask is properly positioned on the transfer arm and to determine if the mask is properly positioned in a masking position. The mask may be used in an ion implanter to shield portions of a workpiece from ion implantation.</abstract><oa>free_for_read</oa></addata></record>
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subjects INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
title Mask position detection
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T07%3A51%3A05IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MCLANE%20JAMES%20R&rft.date=2008-03-27&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2008073569A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true