Method for forming functional film and method for manufacturing liquid crystal display
A method for forming a functional film includes a step of preparing a substrate having a surface roughness of 2.3 nm or greater, a step of preparing a functional film forming composition containing functional film forming material and organic solvent, and a step of forming the functional film throug...
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| creator | HIRUMA KEI HASHIZUME AKINORI ISHIDA KOHEI |
| description | A method for forming a functional film includes a step of preparing a substrate having a surface roughness of 2.3 nm or greater, a step of preparing a functional film forming composition containing functional film forming material and organic solvent, and a step of forming the functional film through ejection of the functional film forming composition onto the substrate using a droplet ejection apparatus. |
| format | Patent |
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| subjects | APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
| title | Method for forming functional film and method for manufacturing liquid crystal display |
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