STRUCTURE AND METHOD FOR REDUCING SUSCEPTIBILITY TO CHARGING DAMAGE IN SOI DESIGNS
Disclosed is a protection circuit for an integrated circuit device, wherein said protection circuit comprises: a first element connected to a gate of a first FET device; and a second element connected to a gate of a second FET device, wherein a drain/source of the first FET device and a drain/source...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Disclosed is a protection circuit for an integrated circuit device, wherein said protection circuit comprises: a first element connected to a gate of a first FET device; and a second element connected to a gate of a second FET device, wherein a drain/source of the first FET device and a drain/source of the second FET device are connected to a higher level connector and wherein the higher level connector eliminates a damaging current path between the first element and the second element. |
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