STRUCTURE AND METHOD FOR REDUCING SUSCEPTIBILITY TO CHARGING DAMAGE IN SOI DESIGNS

Disclosed is a protection circuit for an integrated circuit device, wherein said protection circuit comprises: a first element connected to a gate of a first FET device; and a second element connected to a gate of a second FET device, wherein a drain/source of the first FET device and a drain/source...

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Hauptverfasser: ZIMMERMAN JEFFREY S, ENG CHUNG-PING, BONGES HENRY A, HOOK TERENCE B
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Disclosed is a protection circuit for an integrated circuit device, wherein said protection circuit comprises: a first element connected to a gate of a first FET device; and a second element connected to a gate of a second FET device, wherein a drain/source of the first FET device and a drain/source of the second FET device are connected to a higher level connector and wherein the higher level connector eliminates a damaging current path between the first element and the second element.