Plasma deposition apparatus and method for making solar cells
A plasma deposition apparatus for making solar cells comprising a conveyor having a longitudinal axis for supporting at least one substrate; at least two modules each having at least one plasma torch for depositing a layer of a reaction product on the at least one substrate, the at least one plasma...
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| creator | ASLAMI MOHD A WU DAU |
| description | A plasma deposition apparatus for making solar cells comprising a conveyor having a longitudinal axis for supporting at least one substrate; at least two modules each having at least one plasma torch for depositing a layer of a reaction product on the at least one substrate, the at least one plasma torch located a distance from the at least one substrate; a chamber for containing the conveyor and the at least two modules; and an exhaust system. In another embodiment, the plasma deposition apparatus for making solar cells comprises: means for supporting a substrate; means for supplying reactants; plasma torch means for depositing a product on the substrate, the plasma torch means located a distance from the substrate; and means for oscillating the plasma torch means relative to the substrate. |
| format | Patent |
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In another embodiment, the plasma deposition apparatus for making solar cells comprises: means for supporting a substrate; means for supplying reactants; plasma torch means for depositing a product on the substrate, the plasma torch means located a distance from the substrate; and means for oscillating the plasma torch means relative to the substrate.</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20071018&DB=EPODOC&CC=US&NR=2007243338A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20071018&DB=EPODOC&CC=US&NR=2007243338A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ASLAMI MOHD A</creatorcontrib><creatorcontrib>WU DAU</creatorcontrib><title>Plasma deposition apparatus and method for making solar cells</title><description>A plasma deposition apparatus for making solar cells comprising a conveyor having a longitudinal axis for supporting at least one substrate; at least two modules each having at least one plasma torch for depositing a layer of a reaction product on the at least one substrate, the at least one plasma torch located a distance from the at least one substrate; a chamber for containing the conveyor and the at least two modules; and an exhaust system. In another embodiment, the plasma deposition apparatus for making solar cells comprises: means for supporting a substrate; means for supplying reactants; plasma torch means for depositing a product on the substrate, the plasma torch means located a distance from the substrate; and means for oscillating the plasma torch means relative to the substrate.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLANyEkszk1USEktyC_OLMnMz1NILChILEosKS1WSMxLUchNLcnIT1FIyy9SyE3MzsxLVyjOz0ksUkhOzckp5mFgTUvMKU7lhdLcDMpuriHOHrpA0-JTiwsSk1PzUkviQ4ONDAzMjUyMjY0tHA2NiVMFAO2BMSs</recordid><startdate>20071018</startdate><enddate>20071018</enddate><creator>ASLAMI MOHD A</creator><creator>WU DAU</creator><scope>EVB</scope></search><sort><creationdate>20071018</creationdate><title>Plasma deposition apparatus and method for making solar cells</title><author>ASLAMI MOHD A ; WU DAU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2007243338A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>ASLAMI MOHD A</creatorcontrib><creatorcontrib>WU DAU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ASLAMI MOHD A</au><au>WU DAU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Plasma deposition apparatus and method for making solar cells</title><date>2007-10-18</date><risdate>2007</risdate><abstract>A plasma deposition apparatus for making solar cells comprising a conveyor having a longitudinal axis for supporting at least one substrate; at least two modules each having at least one plasma torch for depositing a layer of a reaction product on the at least one substrate, the at least one plasma torch located a distance from the at least one substrate; a chamber for containing the conveyor and the at least two modules; and an exhaust system. In another embodiment, the plasma deposition apparatus for making solar cells comprises: means for supporting a substrate; means for supplying reactants; plasma torch means for depositing a product on the substrate, the plasma torch means located a distance from the substrate; and means for oscillating the plasma torch means relative to the substrate.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Plasma deposition apparatus and method for making solar cells |
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