Methods of fabricating isolation regions of semiconductor devices and structures thereof

Methods of fabricating isolation regions of semiconductor devices and structures thereof are disclosed. In a preferred embodiment, a semiconductor device includes a workpiece and at least one trench formed in the workpiece. The at least one trench includes sidewalls, a bottom surface, a lower portio...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HAMPP ROLAND, TILKE ARMIN, HONG BEE K, CULMSEE MARCUS, STAPELMANN CHRIS
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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