Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample

Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample

The invention relates to an inspection apparatus and a method for inspecting a sample, such as a lithographic patterning device or mask, for anomalies, such as contamination particles or defects. The inspection apparatus includes a support structure constructed and arranged to support the sample, an...

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Hauptverfasser: VAN BRUG HEDSER, BROUWER EGBERT A.M
Format: Patent
Sprache:eng
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INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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creator VAN BRUG HEDSER
BROUWER EGBERT A.M
description The invention relates to an inspection apparatus and a method for inspecting a sample, such as a lithographic patterning device or mask, for anomalies, such as contamination particles or defects. The inspection apparatus includes a support structure constructed and arranged to support the sample, and a radiation system constructed and arranged to radiate a sample with a radiation beam. The radiation system is provided with a first polarizer. The apparatus also includes a detection system constructed and arranged to detect radiation that is reflected from the sample with a detector. The detection system is provided with a second polarizer.
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subjects INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
title Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample
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