QUALIFICATION OF A MASK
A method for qualifying printability of a mask, including performing a first inspection of the mask with an optical assembly at a first numerical aperture of collection (NAC) of radiation from the mask, and determining, in response to the first inspection, a first possible defect in the mask and a f...
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| creator | BRAUDE CHAIM GREENBERG GADI BARTOV AVISHAI |
| description | A method for qualifying printability of a mask, including performing a first inspection of the mask with an optical assembly at a first numerical aperture of collection (NAC) of radiation from the mask, and determining, in response to the first inspection, a first possible defect in the mask and a first location of the first possible defect. The method also includes performing a second inspection of the mask with the optical assembly at a second NAC of radiation from the mask, different from the first NAC, and determining, in response thereto, a second possible defect in the mask and a second location of the second possible defect. The method further includes performing a comparison of the first and second locations, and in response to the comparison, determining that the first and second possible defects represent a real defect if the first location matches the second location. |
| format | Patent |
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The method also includes performing a second inspection of the mask with the optical assembly at a second NAC of radiation from the mask, different from the first NAC, and determining, in response thereto, a second possible defect in the mask and a second location of the second possible defect. The method further includes performing a comparison of the first and second locations, and in response to the comparison, determining that the first and second possible defects represent a real defect if the first location matches the second location.</description><language>eng</language><subject>ELECTRIC COMMUNICATION TECHNIQUE ; ELECTRICITY ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; PHYSICS ; TELEPHONIC COMMUNICATION ; TESTING ; TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHICCOMMUNICATION ; WIRELESS COMMUNICATIONS NETWORKS</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070607&DB=EPODOC&CC=US&NR=2007127017A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070607&DB=EPODOC&CC=US&NR=2007127017A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>BRAUDE CHAIM</creatorcontrib><creatorcontrib>GREENBERG GADI</creatorcontrib><creatorcontrib>BARTOV AVISHAI</creatorcontrib><title>QUALIFICATION OF A MASK</title><description>A method for qualifying printability of a mask, including performing a first inspection of the mask with an optical assembly at a first numerical aperture of collection (NAC) of radiation from the mask, and determining, in response to the first inspection, a first possible defect in the mask and a first location of the first possible defect. The method also includes performing a second inspection of the mask with the optical assembly at a second NAC of radiation from the mask, different from the first NAC, and determining, in response thereto, a second possible defect in the mask and a second location of the second possible defect. The method further includes performing a comparison of the first and second locations, and in response to the comparison, determining that the first and second possible defects represent a real defect if the first location matches the second location.</description><subject>ELECTRIC COMMUNICATION TECHNIQUE</subject><subject>ELECTRICITY</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>PHYSICS</subject><subject>TELEPHONIC COMMUNICATION</subject><subject>TESTING</subject><subject>TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHICCOMMUNICATION</subject><subject>WIRELESS COMMUNICATIONS NETWORKS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAPDHX08XTzdHYM8fT3U_B3U3BU8HUM9uZhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGBuaGRuYGhuaOhsbEqQIAOhYgEw</recordid><startdate>20070607</startdate><enddate>20070607</enddate><creator>BRAUDE CHAIM</creator><creator>GREENBERG GADI</creator><creator>BARTOV AVISHAI</creator><scope>EVB</scope></search><sort><creationdate>20070607</creationdate><title>QUALIFICATION OF A MASK</title><author>BRAUDE CHAIM ; GREENBERG GADI ; BARTOV AVISHAI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2007127017A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><topic>ELECTRIC COMMUNICATION TECHNIQUE</topic><topic>ELECTRICITY</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>PHYSICS</topic><topic>TELEPHONIC COMMUNICATION</topic><topic>TESTING</topic><topic>TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHICCOMMUNICATION</topic><topic>WIRELESS COMMUNICATIONS NETWORKS</topic><toplevel>online_resources</toplevel><creatorcontrib>BRAUDE CHAIM</creatorcontrib><creatorcontrib>GREENBERG GADI</creatorcontrib><creatorcontrib>BARTOV AVISHAI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>BRAUDE CHAIM</au><au>GREENBERG GADI</au><au>BARTOV AVISHAI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>QUALIFICATION OF A MASK</title><date>2007-06-07</date><risdate>2007</risdate><abstract>A method for qualifying printability of a mask, including performing a first inspection of the mask with an optical assembly at a first numerical aperture of collection (NAC) of radiation from the mask, and determining, in response to the first inspection, a first possible defect in the mask and a first location of the first possible defect. The method also includes performing a second inspection of the mask with the optical assembly at a second NAC of radiation from the mask, different from the first NAC, and determining, in response thereto, a second possible defect in the mask and a second location of the second possible defect. The method further includes performing a comparison of the first and second locations, and in response to the comparison, determining that the first and second possible defects represent a real defect if the first location matches the second location.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | ELECTRIC COMMUNICATION TECHNIQUE ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TELEPHONIC COMMUNICATION TESTING TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHICCOMMUNICATION WIRELESS COMMUNICATIONS NETWORKS |
| title | QUALIFICATION OF A MASK |
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