System and method for compensating for radiation induced thermal distortions

A system and method are used to compensate for thermal effect on a lithographic apparatus. The system comprises a patterning device, a projection system, a substrate position controller, and a substrate-position-based expansion-compensator. The patterning device modulates a radiation beam. The proje...

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Bibliographische Detailangaben

Hauptverfasser:	VENEMA WILLEM J, MARIA ZAAL KOEN J.J, TINNEMANS PATRICIUS A.J
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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