METHOD FOR REDUCING FOREIGN MATERIAL CONCENTRATIONS IN ETCH CHAMBERS

A method of reducing foreign material concentrations in an etch chamber having inner chamber walls is described. The method includes the step of etching a work piece in the etch chamber such that reaction products from the work piece having one or more elements form a first layer of reaction product...

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Bibliographische Detailangaben
Hauptverfasser: STAMPER ANTHONY KENDALL, COONEY EDWARD CRANDAL III
Format: Patent
Sprache:eng
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