Metrology apparatus, lithographic apparatus, process apparatus metrology method and device manufacturing method

Metrology apparatus, lithographic apparatus, process apparatus metrology method and device manufacturing method

A metrology apparatus for measuring a parameter of a microscopic structure on a substrate, the apparatus comprising a supercontinuum light source arranged to generate a measurement beam, an optical system arranged to direct the measurement beam onto the substrate and a sensor for detecting radiation...

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Hauptverfasser: DEN BOEF ARIE J, CORBEIJ WILHELMUS M, LAAN HANS V.D, PELLEMANS HENRICUS PETRUS M
Format: Patent
Sprache:eng
Schlagworte:
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
TESTING
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creator DEN BOEF ARIE J
CORBEIJ WILHELMUS M
LAAN HANS V.D
PELLEMANS HENRICUS PETRUS M
description A metrology apparatus for measuring a parameter of a microscopic structure on a substrate, the apparatus comprising a supercontinuum light source arranged to generate a measurement beam, an optical system arranged to direct the measurement beam onto the substrate and a sensor for detecting radiation reflected and/or diffracted by the structure.
format Patent
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subjects MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
TESTING
title Metrology apparatus, lithographic apparatus, process apparatus metrology method and device manufacturing method
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