Method to fabricate horizontal air columns underneath metal inductor

Method to fabricate horizontal air columns underneath metal inductor

A new method is provided for creating an inductor on the surface of a silicon substrate. The invention provides overlying layers of oxide fins beneath a metal inductor. The oxide fins provide the stability support for the overlying metal inductor while also allowing horizontal air columns to simulta...

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Hauptverfasser: CHEW KOK WAI JOHNNY, CHA CHER LIANG, CHUA CHEE TEE, CHAN LAP
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Sprache:eng
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BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INDUCTANCES
MAGNETS
SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
SEMICONDUCTOR DEVICES
TRANSFORMERS
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creator CHEW KOK WAI JOHNNY
CHA CHER LIANG
CHUA CHEE TEE
CHAN LAP
description A new method is provided for creating an inductor on the surface of a silicon substrate. The invention provides overlying layers of oxide fins beneath a metal inductor. The oxide fins provide the stability support for the overlying metal inductor while also allowing horizontal air columns to simultaneously exist underneath the inductor. Overlying layers of air cavities that are spatially inserted between the created overlying layers of oxide fins can be created under the invention by repetitive application of the mask used. The presence of the air wells on the surface of the substrate significantly reduces parasitic capacitances and series resistance of the inductor associated with the substrate.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2007007623A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2007007623A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2007007623A13</originalsourceid><addsrcrecordid>eNrjZHDxTS3JyE9RKMlXSEtMKspMTixJVcjIL8qsys8rScxRSMwsUkjOzynNzStWKM1LSS3KS00syVDITQVJZuallCaX5BfxMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JL40GAjAwNzIDIzMnY0NCZOFQCwwjQq</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method to fabricate horizontal air columns underneath metal inductor</title><source>esp@cenet</source><creator>CHEW KOK WAI JOHNNY ; CHA CHER LIANG ; CHUA CHEE TEE ; CHAN LAP</creator><creatorcontrib>CHEW KOK WAI JOHNNY ; CHA CHER LIANG ; CHUA CHEE TEE ; CHAN LAP</creatorcontrib><description>A new method is provided for creating an inductor on the surface of a silicon substrate. The invention provides overlying layers of oxide fins beneath a metal inductor. The oxide fins provide the stability support for the overlying metal inductor while also allowing horizontal air columns to simultaneously exist underneath the inductor. Overlying layers of air cavities that are spatially inserted between the created overlying layers of oxide fins can be created under the invention by repetitive application of the mask used. The presence of the air wells on the surface of the substrate significantly reduces parasitic capacitances and series resistance of the inductor associated with the substrate.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INDUCTANCES ; MAGNETS ; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES ; SEMICONDUCTOR DEVICES ; TRANSFORMERS</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20070111&amp;DB=EPODOC&amp;CC=US&amp;NR=2007007623A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20070111&amp;DB=EPODOC&amp;CC=US&amp;NR=2007007623A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHEW KOK WAI JOHNNY</creatorcontrib><creatorcontrib>CHA CHER LIANG</creatorcontrib><creatorcontrib>CHUA CHEE TEE</creatorcontrib><creatorcontrib>CHAN LAP</creatorcontrib><title>Method to fabricate horizontal air columns underneath metal inductor</title><description>A new method is provided for creating an inductor on the surface of a silicon substrate. The invention provides overlying layers of oxide fins beneath a metal inductor. The oxide fins provide the stability support for the overlying metal inductor while also allowing horizontal air columns to simultaneously exist underneath the inductor. Overlying layers of air cavities that are spatially inserted between the created overlying layers of oxide fins can be created under the invention by repetitive application of the mask used. The presence of the air wells on the surface of the substrate significantly reduces parasitic capacitances and series resistance of the inductor associated with the substrate.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INDUCTANCES</subject><subject>MAGNETS</subject><subject>SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSFORMERS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHDxTS3JyE9RKMlXSEtMKspMTixJVcjIL8qsys8rScxRSMwsUkjOzynNzStWKM1LSS3KS00syVDITQVJZuallCaX5BfxMLCmJeYUp_JCaW4GZTfXEGcP3dSC_PjU4oLE5NS81JL40GAjAwNzIDIzMnY0NCZOFQCwwjQq</recordid><startdate>20070111</startdate><enddate>20070111</enddate><creator>CHEW KOK WAI JOHNNY</creator><creator>CHA CHER LIANG</creator><creator>CHUA CHEE TEE</creator><creator>CHAN LAP</creator><scope>EVB</scope></search><sort><creationdate>20070111</creationdate><title>Method to fabricate horizontal air columns underneath metal inductor</title><author>CHEW KOK WAI JOHNNY ; CHA CHER LIANG ; CHUA CHEE TEE ; CHAN LAP</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2007007623A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INDUCTANCES</topic><topic>MAGNETS</topic><topic>SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSFORMERS</topic><toplevel>online_resources</toplevel><creatorcontrib>CHEW KOK WAI JOHNNY</creatorcontrib><creatorcontrib>CHA CHER LIANG</creatorcontrib><creatorcontrib>CHUA CHEE TEE</creatorcontrib><creatorcontrib>CHAN LAP</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHEW KOK WAI JOHNNY</au><au>CHA CHER LIANG</au><au>CHUA CHEE TEE</au><au>CHAN LAP</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method to fabricate horizontal air columns underneath metal inductor</title><date>2007-01-11</date><risdate>2007</risdate><abstract>A new method is provided for creating an inductor on the surface of a silicon substrate. The invention provides overlying layers of oxide fins beneath a metal inductor. The oxide fins provide the stability support for the overlying metal inductor while also allowing horizontal air columns to simultaneously exist underneath the inductor. Overlying layers of air cavities that are spatially inserted between the created overlying layers of oxide fins can be created under the invention by repetitive application of the mask used. The presence of the air wells on the surface of the substrate significantly reduces parasitic capacitances and series resistance of the inductor associated with the substrate.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INDUCTANCES
MAGNETS
SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
SEMICONDUCTOR DEVICES
TRANSFORMERS
title Method to fabricate horizontal air columns underneath metal inductor
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-27T06%3A36%3A40IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=CHEW%20KOK%20WAI%20JOHNNY&rft.date=2007-01-11&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2007007623A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true