Etchant, method of etching, laminate formed thereby, and device
An etchant including a halogenated salt, such as Cryolite (Na3AlF6) or potassium tetrafluoro borate (KBF4), is provided. The salt may be present in the etchant in an amount sufficient to etch a substrate and may have a melt temperature of greater than about 200 degrees Celsius. A method of wet etchi...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | TYSOE STEVEN A LEBOEUF STEVEN F BECKER CHARLES A VENKATARAMANI VENKAT S ARTHUR STEPHEN D WOJNAROWSKI ROBERT J EBONG ABASIFREKE U DASGUPTA SAMHITA SUBRAMANIAN KANAKASABAPATHI TILAK VINAYAK D'EVELYN MARK P FORTIN JEFFREY B |
| description | An etchant including a halogenated salt, such as Cryolite (Na3AlF6) or potassium tetrafluoro borate (KBF4), is provided. The salt may be present in the etchant in an amount sufficient to etch a substrate and may have a melt temperature of greater than about 200 degrees Celsius. A method of wet etching may include contacting an etchant to at least one surface of a support layer of a multi-layer laminate, wherein the support layer may include aluminum oxide; or contacting an etchant to at least one surface of a support layer of a multi-layer laminate, wherein the etchant may include Cryolite (Na3AlF6), potassium tetrafluoro borate (KBF4), or both; and etching at least a portion of the support layer. The method may provide a laminate produced by growing a crystal onto an aluminum oxide support layer, and chemically removing at least a portion of the support layer by wet etch. An electronic device, optical device or combined device including the laminate is provided. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2006289386A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2006289386A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2006289386A13</originalsourceid><addsrcrecordid>eNrjZLB3LUnOSMwr0VHITS3JyE9RyE9TSAUKZeal6yjkJOZm5iWWpCqk5RflpqYolGSkFqUmVeooJOalKKSklmUmp_IwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUkvjQYCMDAzMjC0tjCzNHQ2PiVAEA6lcxEw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Etchant, method of etching, laminate formed thereby, and device</title><source>esp@cenet</source><creator>TYSOE STEVEN A ; LEBOEUF STEVEN F ; BECKER CHARLES A ; VENKATARAMANI VENKAT S ; ARTHUR STEPHEN D ; WOJNAROWSKI ROBERT J ; EBONG ABASIFREKE U ; DASGUPTA SAMHITA ; SUBRAMANIAN KANAKASABAPATHI ; TILAK VINAYAK ; D'EVELYN MARK P ; FORTIN JEFFREY B</creator><creatorcontrib>TYSOE STEVEN A ; LEBOEUF STEVEN F ; BECKER CHARLES A ; VENKATARAMANI VENKAT S ; ARTHUR STEPHEN D ; WOJNAROWSKI ROBERT J ; EBONG ABASIFREKE U ; DASGUPTA SAMHITA ; SUBRAMANIAN KANAKASABAPATHI ; TILAK VINAYAK ; D'EVELYN MARK P ; FORTIN JEFFREY B</creatorcontrib><description>An etchant including a halogenated salt, such as Cryolite (Na3AlF6) or potassium tetrafluoro borate (KBF4), is provided. The salt may be present in the etchant in an amount sufficient to etch a substrate and may have a melt temperature of greater than about 200 degrees Celsius. A method of wet etching may include contacting an etchant to at least one surface of a support layer of a multi-layer laminate, wherein the support layer may include aluminum oxide; or contacting an etchant to at least one surface of a support layer of a multi-layer laminate, wherein the etchant may include Cryolite (Na3AlF6), potassium tetrafluoro borate (KBF4), or both; and etching at least a portion of the support layer. The method may provide a laminate produced by growing a crystal onto an aluminum oxide support layer, and chemically removing at least a portion of the support layer by wet etch. An electronic device, optical device or combined device including the laminate is provided.</description><language>eng</language><subject>ADHESIVES ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; DECORATIVE ARTS ; DYES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; MEASURING ; MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; MOSAICS ; NATURAL RESINS ; PAINTS ; PAPERHANGING ; PERFORMING OPERATIONS ; PHYSICS ; POLISHES ; PRODUCING DECORATIVE EFFECTS ; SEMICONDUCTOR DEVICES ; TARSIA WORK ; TESTING ; TRANSPORTING</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20061228&DB=EPODOC&CC=US&NR=2006289386A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20061228&DB=EPODOC&CC=US&NR=2006289386A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TYSOE STEVEN A</creatorcontrib><creatorcontrib>LEBOEUF STEVEN F</creatorcontrib><creatorcontrib>BECKER CHARLES A</creatorcontrib><creatorcontrib>VENKATARAMANI VENKAT S</creatorcontrib><creatorcontrib>ARTHUR STEPHEN D</creatorcontrib><creatorcontrib>WOJNAROWSKI ROBERT J</creatorcontrib><creatorcontrib>EBONG ABASIFREKE U</creatorcontrib><creatorcontrib>DASGUPTA SAMHITA</creatorcontrib><creatorcontrib>SUBRAMANIAN KANAKASABAPATHI</creatorcontrib><creatorcontrib>TILAK VINAYAK</creatorcontrib><creatorcontrib>D'EVELYN MARK P</creatorcontrib><creatorcontrib>FORTIN JEFFREY B</creatorcontrib><title>Etchant, method of etching, laminate formed thereby, and device</title><description>An etchant including a halogenated salt, such as Cryolite (Na3AlF6) or potassium tetrafluoro borate (KBF4), is provided. The salt may be present in the etchant in an amount sufficient to etch a substrate and may have a melt temperature of greater than about 200 degrees Celsius. A method of wet etching may include contacting an etchant to at least one surface of a support layer of a multi-layer laminate, wherein the support layer may include aluminum oxide; or contacting an etchant to at least one surface of a support layer of a multi-layer laminate, wherein the etchant may include Cryolite (Na3AlF6), potassium tetrafluoro borate (KBF4), or both; and etching at least a portion of the support layer. The method may provide a laminate produced by growing a crystal onto an aluminum oxide support layer, and chemically removing at least a portion of the support layer by wet etch. An electronic device, optical device or combined device including the laminate is provided.</description><subject>ADHESIVES</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>DECORATIVE ARTS</subject><subject>DYES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>MEASURING</subject><subject>MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>MOSAICS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>PAPERHANGING</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>PRODUCING DECORATIVE EFFECTS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TARSIA WORK</subject><subject>TESTING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2006</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLB3LUnOSMwr0VHITS3JyE9RyE9TSAUKZeal6yjkJOZm5iWWpCqk5RflpqYolGSkFqUmVeooJOalKKSklmUmp_IwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUkvjQYCMDAzMjC0tjCzNHQ2PiVAEA6lcxEw</recordid><startdate>20061228</startdate><enddate>20061228</enddate><creator>TYSOE STEVEN A</creator><creator>LEBOEUF STEVEN F</creator><creator>BECKER CHARLES A</creator><creator>VENKATARAMANI VENKAT S</creator><creator>ARTHUR STEPHEN D</creator><creator>WOJNAROWSKI ROBERT J</creator><creator>EBONG ABASIFREKE U</creator><creator>DASGUPTA SAMHITA</creator><creator>SUBRAMANIAN KANAKASABAPATHI</creator><creator>TILAK VINAYAK</creator><creator>D'EVELYN MARK P</creator><creator>FORTIN JEFFREY B</creator><scope>EVB</scope></search><sort><creationdate>20061228</creationdate><title>Etchant, method of etching, laminate formed thereby, and device</title><author>TYSOE STEVEN A ; LEBOEUF STEVEN F ; BECKER CHARLES A ; VENKATARAMANI VENKAT S ; ARTHUR STEPHEN D ; WOJNAROWSKI ROBERT J ; EBONG ABASIFREKE U ; DASGUPTA SAMHITA ; SUBRAMANIAN KANAKASABAPATHI ; TILAK VINAYAK ; D'EVELYN MARK P ; FORTIN JEFFREY B</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2006289386A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2006</creationdate><topic>ADHESIVES</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>DECORATIVE ARTS</topic><topic>DYES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>MEASURING</topic><topic>MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>MOSAICS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>PAPERHANGING</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>PRODUCING DECORATIVE EFFECTS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TARSIA WORK</topic><topic>TESTING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>TYSOE STEVEN A</creatorcontrib><creatorcontrib>LEBOEUF STEVEN F</creatorcontrib><creatorcontrib>BECKER CHARLES A</creatorcontrib><creatorcontrib>VENKATARAMANI VENKAT S</creatorcontrib><creatorcontrib>ARTHUR STEPHEN D</creatorcontrib><creatorcontrib>WOJNAROWSKI ROBERT J</creatorcontrib><creatorcontrib>EBONG ABASIFREKE U</creatorcontrib><creatorcontrib>DASGUPTA SAMHITA</creatorcontrib><creatorcontrib>SUBRAMANIAN KANAKASABAPATHI</creatorcontrib><creatorcontrib>TILAK VINAYAK</creatorcontrib><creatorcontrib>D'EVELYN MARK P</creatorcontrib><creatorcontrib>FORTIN JEFFREY B</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TYSOE STEVEN A</au><au>LEBOEUF STEVEN F</au><au>BECKER CHARLES A</au><au>VENKATARAMANI VENKAT S</au><au>ARTHUR STEPHEN D</au><au>WOJNAROWSKI ROBERT J</au><au>EBONG ABASIFREKE U</au><au>DASGUPTA SAMHITA</au><au>SUBRAMANIAN KANAKASABAPATHI</au><au>TILAK VINAYAK</au><au>D'EVELYN MARK P</au><au>FORTIN JEFFREY B</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Etchant, method of etching, laminate formed thereby, and device</title><date>2006-12-28</date><risdate>2006</risdate><abstract>An etchant including a halogenated salt, such as Cryolite (Na3AlF6) or potassium tetrafluoro borate (KBF4), is provided. The salt may be present in the etchant in an amount sufficient to etch a substrate and may have a melt temperature of greater than about 200 degrees Celsius. A method of wet etching may include contacting an etchant to at least one surface of a support layer of a multi-layer laminate, wherein the support layer may include aluminum oxide; or contacting an etchant to at least one surface of a support layer of a multi-layer laminate, wherein the etchant may include Cryolite (Na3AlF6), potassium tetrafluoro borate (KBF4), or both; and etching at least a portion of the support layer. The method may provide a laminate produced by growing a crystal onto an aluminum oxide support layer, and chemically removing at least a portion of the support layer by wet etch. An electronic device, optical device or combined device including the laminate is provided.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US2006289386A1 |
| source | esp@cenet |
| subjects | ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DECORATIVE ARTS DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MEASURING MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS MOSAICS NATURAL RESINS PAINTS PAPERHANGING PERFORMING OPERATIONS PHYSICS POLISHES PRODUCING DECORATIVE EFFECTS SEMICONDUCTOR DEVICES TARSIA WORK TESTING TRANSPORTING |
| title | Etchant, method of etching, laminate formed thereby, and device |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-23T16%3A49%3A37IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TYSOE%20STEVEN%20A&rft.date=2006-12-28&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2006289386A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |