Methods and apparatus for enabling multiple process steps on a single substrate
Substrate masking apparatus includes a platen assembly to support a substrate for processing, a mask having an aperture, a retaining mechanism to retain the mask in a masking position, and a positioning mechanism to change the relative positions of the mask and the substrate so that different areas...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | HERTEL RICHARD J BARSKY SAMUEL NUNAN PETER MURPHY PAUL SHENG ALAN SHIM KYU-HA ANELLA STEVEN RENAU ANTHONY TEODORCZYK CHARLES FICARRA LAWRENCE |
| description | Substrate masking apparatus includes a platen assembly to support a substrate for processing, a mask having an aperture, a retaining mechanism to retain the mask in a masking position, and a positioning mechanism to change the relative positions of the mask and the substrate so that different areas of the substrate are exposed through the aperture in the mask. The apparatus may further include a mask loading mechanism to transfer the mask to and between the masking position and a non-masking position. The processing may include ion implantation of the substrate with different implant parameter values in different areas. In other embodiments, an area of the substrate to be processed is selectable by a mask, a shutter or a beam modifier in front of the substrate. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2006258128A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2006258128A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2006258128A13</originalsourceid><addsrcrecordid>eNqNizEKwkAQAK-xEPUPC9ZCcqKkFVFsxEKtwybZaODcW273_u8VPsBqipmZu9uV7B0HBeQBUAQTWlYYYwJi7MLEL_jkYJMEAkmxJ1VQI1GIDAhagmI0d2plpaWbjRiUVj8u3Pp8ehwvG5LYkgr2xGTt8-6rau93Te2bQ739r_oCUTs4JA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Methods and apparatus for enabling multiple process steps on a single substrate</title><source>esp@cenet</source><creator>HERTEL RICHARD J ; BARSKY SAMUEL ; NUNAN PETER ; MURPHY PAUL ; SHENG ALAN ; SHIM KYU-HA ; ANELLA STEVEN ; RENAU ANTHONY ; TEODORCZYK CHARLES ; FICARRA LAWRENCE</creator><creatorcontrib>HERTEL RICHARD J ; BARSKY SAMUEL ; NUNAN PETER ; MURPHY PAUL ; SHENG ALAN ; SHIM KYU-HA ; ANELLA STEVEN ; RENAU ANTHONY ; TEODORCZYK CHARLES ; FICARRA LAWRENCE</creatorcontrib><description>Substrate masking apparatus includes a platen assembly to support a substrate for processing, a mask having an aperture, a retaining mechanism to retain the mask in a masking position, and a positioning mechanism to change the relative positions of the mask and the substrate so that different areas of the substrate are exposed through the aperture in the mask. The apparatus may further include a mask loading mechanism to transfer the mask to and between the masking position and a non-masking position. The processing may include ion implantation of the substrate with different implant parameter values in different areas. In other embodiments, an area of the substrate to be processed is selectable by a mask, a shutter or a beam modifier in front of the substrate.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20061116&DB=EPODOC&CC=US&NR=2006258128A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20061116&DB=EPODOC&CC=US&NR=2006258128A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HERTEL RICHARD J</creatorcontrib><creatorcontrib>BARSKY SAMUEL</creatorcontrib><creatorcontrib>NUNAN PETER</creatorcontrib><creatorcontrib>MURPHY PAUL</creatorcontrib><creatorcontrib>SHENG ALAN</creatorcontrib><creatorcontrib>SHIM KYU-HA</creatorcontrib><creatorcontrib>ANELLA STEVEN</creatorcontrib><creatorcontrib>RENAU ANTHONY</creatorcontrib><creatorcontrib>TEODORCZYK CHARLES</creatorcontrib><creatorcontrib>FICARRA LAWRENCE</creatorcontrib><title>Methods and apparatus for enabling multiple process steps on a single substrate</title><description>Substrate masking apparatus includes a platen assembly to support a substrate for processing, a mask having an aperture, a retaining mechanism to retain the mask in a masking position, and a positioning mechanism to change the relative positions of the mask and the substrate so that different areas of the substrate are exposed through the aperture in the mask. The apparatus may further include a mask loading mechanism to transfer the mask to and between the masking position and a non-masking position. The processing may include ion implantation of the substrate with different implant parameter values in different areas. In other embodiments, an area of the substrate to be processed is selectable by a mask, a shutter or a beam modifier in front of the substrate.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2006</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNizEKwkAQAK-xEPUPC9ZCcqKkFVFsxEKtwybZaODcW273_u8VPsBqipmZu9uV7B0HBeQBUAQTWlYYYwJi7MLEL_jkYJMEAkmxJ1VQI1GIDAhagmI0d2plpaWbjRiUVj8u3Pp8ehwvG5LYkgr2xGTt8-6rau93Te2bQ739r_oCUTs4JA</recordid><startdate>20061116</startdate><enddate>20061116</enddate><creator>HERTEL RICHARD J</creator><creator>BARSKY SAMUEL</creator><creator>NUNAN PETER</creator><creator>MURPHY PAUL</creator><creator>SHENG ALAN</creator><creator>SHIM KYU-HA</creator><creator>ANELLA STEVEN</creator><creator>RENAU ANTHONY</creator><creator>TEODORCZYK CHARLES</creator><creator>FICARRA LAWRENCE</creator><scope>EVB</scope></search><sort><creationdate>20061116</creationdate><title>Methods and apparatus for enabling multiple process steps on a single substrate</title><author>HERTEL RICHARD J ; BARSKY SAMUEL ; NUNAN PETER ; MURPHY PAUL ; SHENG ALAN ; SHIM KYU-HA ; ANELLA STEVEN ; RENAU ANTHONY ; TEODORCZYK CHARLES ; FICARRA LAWRENCE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2006258128A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2006</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>HERTEL RICHARD J</creatorcontrib><creatorcontrib>BARSKY SAMUEL</creatorcontrib><creatorcontrib>NUNAN PETER</creatorcontrib><creatorcontrib>MURPHY PAUL</creatorcontrib><creatorcontrib>SHENG ALAN</creatorcontrib><creatorcontrib>SHIM KYU-HA</creatorcontrib><creatorcontrib>ANELLA STEVEN</creatorcontrib><creatorcontrib>RENAU ANTHONY</creatorcontrib><creatorcontrib>TEODORCZYK CHARLES</creatorcontrib><creatorcontrib>FICARRA LAWRENCE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HERTEL RICHARD J</au><au>BARSKY SAMUEL</au><au>NUNAN PETER</au><au>MURPHY PAUL</au><au>SHENG ALAN</au><au>SHIM KYU-HA</au><au>ANELLA STEVEN</au><au>RENAU ANTHONY</au><au>TEODORCZYK CHARLES</au><au>FICARRA LAWRENCE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Methods and apparatus for enabling multiple process steps on a single substrate</title><date>2006-11-16</date><risdate>2006</risdate><abstract>Substrate masking apparatus includes a platen assembly to support a substrate for processing, a mask having an aperture, a retaining mechanism to retain the mask in a masking position, and a positioning mechanism to change the relative positions of the mask and the substrate so that different areas of the substrate are exposed through the aperture in the mask. The apparatus may further include a mask loading mechanism to transfer the mask to and between the masking position and a non-masking position. The processing may include ion implantation of the substrate with different implant parameter values in different areas. In other embodiments, an area of the substrate to be processed is selectable by a mask, a shutter or a beam modifier in front of the substrate.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US2006258128A1 |
| source | esp@cenet |
| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | Methods and apparatus for enabling multiple process steps on a single substrate |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-13T16%3A21%3A39IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HERTEL%20RICHARD%20J&rft.date=2006-11-16&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2006258128A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |