Application of in-situ plasma measurements to performance and control of a plasma processing system

A system and method for managing a plasma system is described. In one embodiment the method includes measuring at least one aspect of a state of plasma in the plasma system so as to obtain plasma state data, receiving subsystem data, which is indicative of at least one subsystem of the plasma system...

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Bibliographische Detailangaben
1. Verfasser: MAHONEY LEONARD J
Format: Patent
Sprache:eng
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