Latent overlay metrology
An apparatus and method for improved latent overlay metrology is disclosed. In an embodiment, a scatterometer and an overexposed overlay target are used to obtain more robust overlay measurement.
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| creator | DUSA MIRCEA KIERS ANTOINE G.M SCHAAR MAURITS V.D BOEF ARIE J.D BURGHOORN JACOBUS |
| description | An apparatus and method for improved latent overlay metrology is disclosed. In an embodiment, a scatterometer and an overexposed overlay target are used to obtain more robust overlay measurement. |
| format | Patent |
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| subjects | MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING |
| title | Latent overlay metrology |
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