Alignment systems and methods for lithographic systems
An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to proces...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | Y. KOREN RAMON N HUIJBREGTSE JEROEN BURGHOORN JACOBUS SCHETS SICCO I BOK LEE BRIAN Y VAN HORSSEN HERMANUS G JEUNINK ANDRE B MEGENS HENRY GERTRUDUS SIMONS HUBERTUS J SCHUURHUIS JOHNY R MARIA VAN BILSEN FRANCISCUS B DUNBAR ALLAN R FRANCISCUS VAN HAREN RICHARD J THEODOOR TOLSMA HOITE P HINNEN PAUL C |
| description | An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2006086910A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2006086910A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2006086910A13</originalsourceid><addsrcrecordid>eNrjZDBzzMlMz8tNzStRKK4sLknNLVZIzEtRyE0tychPKVZIyy9SyMkEstOLEgsyMpNhingYWNMSc4pTeaE0N4Oym2uIs4duakF-fGpxQWJyal5qSXxosJGBgZmBhZmloYGjoTFxqgCSIC8M</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Alignment systems and methods for lithographic systems</title><source>esp@cenet</source><creator>Y. KOREN RAMON N ; HUIJBREGTSE JEROEN ; BURGHOORN JACOBUS ; SCHETS SICCO I ; BOK LEE BRIAN Y ; VAN HORSSEN HERMANUS G ; JEUNINK ANDRE B ; MEGENS HENRY ; GERTRUDUS SIMONS HUBERTUS J ; SCHUURHUIS JOHNY R ; MARIA VAN BILSEN FRANCISCUS B ; DUNBAR ALLAN R ; FRANCISCUS VAN HAREN RICHARD J ; THEODOOR TOLSMA HOITE P ; HINNEN PAUL C</creator><creatorcontrib>Y. KOREN RAMON N ; HUIJBREGTSE JEROEN ; BURGHOORN JACOBUS ; SCHETS SICCO I ; BOK LEE BRIAN Y ; VAN HORSSEN HERMANUS G ; JEUNINK ANDRE B ; MEGENS HENRY ; GERTRUDUS SIMONS HUBERTUS J ; SCHUURHUIS JOHNY R ; MARIA VAN BILSEN FRANCISCUS B ; DUNBAR ALLAN R ; FRANCISCUS VAN HAREN RICHARD J ; THEODOOR TOLSMA HOITE P ; HINNEN PAUL C</creatorcontrib><description>An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; DEVICES USING STIMULATED EMISSION ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MATERIALS THEREFOR ; MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; TESTING</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20060427&DB=EPODOC&CC=US&NR=2006086910A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20060427&DB=EPODOC&CC=US&NR=2006086910A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Y. KOREN RAMON N</creatorcontrib><creatorcontrib>HUIJBREGTSE JEROEN</creatorcontrib><creatorcontrib>BURGHOORN JACOBUS</creatorcontrib><creatorcontrib>SCHETS SICCO I</creatorcontrib><creatorcontrib>BOK LEE BRIAN Y</creatorcontrib><creatorcontrib>VAN HORSSEN HERMANUS G</creatorcontrib><creatorcontrib>JEUNINK ANDRE B</creatorcontrib><creatorcontrib>MEGENS HENRY</creatorcontrib><creatorcontrib>GERTRUDUS SIMONS HUBERTUS J</creatorcontrib><creatorcontrib>SCHUURHUIS JOHNY R</creatorcontrib><creatorcontrib>MARIA VAN BILSEN FRANCISCUS B</creatorcontrib><creatorcontrib>DUNBAR ALLAN R</creatorcontrib><creatorcontrib>FRANCISCUS VAN HAREN RICHARD J</creatorcontrib><creatorcontrib>THEODOOR TOLSMA HOITE P</creatorcontrib><creatorcontrib>HINNEN PAUL C</creatorcontrib><title>Alignment systems and methods for lithographic systems</title><description>An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MATERIALS THEREFOR</subject><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2006</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDBzzMlMz8tNzStRKK4sLknNLVZIzEtRyE0tychPKVZIyy9SyMkEstOLEgsyMpNhingYWNMSc4pTeaE0N4Oym2uIs4duakF-fGpxQWJyal5qSXxosJGBgZmBhZmloYGjoTFxqgCSIC8M</recordid><startdate>20060427</startdate><enddate>20060427</enddate><creator>Y. KOREN RAMON N</creator><creator>HUIJBREGTSE JEROEN</creator><creator>BURGHOORN JACOBUS</creator><creator>SCHETS SICCO I</creator><creator>BOK LEE BRIAN Y</creator><creator>VAN HORSSEN HERMANUS G</creator><creator>JEUNINK ANDRE B</creator><creator>MEGENS HENRY</creator><creator>GERTRUDUS SIMONS HUBERTUS J</creator><creator>SCHUURHUIS JOHNY R</creator><creator>MARIA VAN BILSEN FRANCISCUS B</creator><creator>DUNBAR ALLAN R</creator><creator>FRANCISCUS VAN HAREN RICHARD J</creator><creator>THEODOOR TOLSMA HOITE P</creator><creator>HINNEN PAUL C</creator><scope>EVB</scope></search><sort><creationdate>20060427</creationdate><title>Alignment systems and methods for lithographic systems</title><author>Y. KOREN RAMON N ; HUIJBREGTSE JEROEN ; BURGHOORN JACOBUS ; SCHETS SICCO I ; BOK LEE BRIAN Y ; VAN HORSSEN HERMANUS G ; JEUNINK ANDRE B ; MEGENS HENRY ; GERTRUDUS SIMONS HUBERTUS J ; SCHUURHUIS JOHNY R ; MARIA VAN BILSEN FRANCISCUS B ; DUNBAR ALLAN R ; FRANCISCUS VAN HAREN RICHARD J ; THEODOOR TOLSMA HOITE P ; HINNEN PAUL C</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2006086910A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2006</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MATERIALS THEREFOR</topic><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>Y. KOREN RAMON N</creatorcontrib><creatorcontrib>HUIJBREGTSE JEROEN</creatorcontrib><creatorcontrib>BURGHOORN JACOBUS</creatorcontrib><creatorcontrib>SCHETS SICCO I</creatorcontrib><creatorcontrib>BOK LEE BRIAN Y</creatorcontrib><creatorcontrib>VAN HORSSEN HERMANUS G</creatorcontrib><creatorcontrib>JEUNINK ANDRE B</creatorcontrib><creatorcontrib>MEGENS HENRY</creatorcontrib><creatorcontrib>GERTRUDUS SIMONS HUBERTUS J</creatorcontrib><creatorcontrib>SCHUURHUIS JOHNY R</creatorcontrib><creatorcontrib>MARIA VAN BILSEN FRANCISCUS B</creatorcontrib><creatorcontrib>DUNBAR ALLAN R</creatorcontrib><creatorcontrib>FRANCISCUS VAN HAREN RICHARD J</creatorcontrib><creatorcontrib>THEODOOR TOLSMA HOITE P</creatorcontrib><creatorcontrib>HINNEN PAUL C</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Y. KOREN RAMON N</au><au>HUIJBREGTSE JEROEN</au><au>BURGHOORN JACOBUS</au><au>SCHETS SICCO I</au><au>BOK LEE BRIAN Y</au><au>VAN HORSSEN HERMANUS G</au><au>JEUNINK ANDRE B</au><au>MEGENS HENRY</au><au>GERTRUDUS SIMONS HUBERTUS J</au><au>SCHUURHUIS JOHNY R</au><au>MARIA VAN BILSEN FRANCISCUS B</au><au>DUNBAR ALLAN R</au><au>FRANCISCUS VAN HAREN RICHARD J</au><au>THEODOOR TOLSMA HOITE P</au><au>HINNEN PAUL C</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Alignment systems and methods for lithographic systems</title><date>2006-04-27</date><risdate>2006</risdate><abstract>An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US2006086910A1 |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING |
| title | Alignment systems and methods for lithographic systems |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T18%3A52%3A28IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Y.%20KOREN%20RAMON%20N&rft.date=2006-04-27&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2006086910A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |