NON-UNIFORMITY PATTERN IDENTIFICATION SYSTEMS AND METHODS THEREOF

A system for non-uniformity pattern identification. A storage device stores multiple theoretical patterns and measurements. Each measurement corresponds to a region on a wafer. The processing unit acquires the theoretical patterns and the measurements on at least two wafers, calculates pattern score...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: LIU CHIAUN
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator LIU CHIAUN
description A system for non-uniformity pattern identification. A storage device stores multiple theoretical patterns and measurements. Each measurement corresponds to a region on a wafer. The processing unit acquires the theoretical patterns and the measurements on at least two wafers, calculates pattern scores for the respective theoretical patterns of each wafer according to the measurements, and groups at least two of the theoretical patterns into at least one factor according to the pattern scores to identify one or more non-uniformity patterns for the wafers. Each pattern score represents the extent of similarity between one of the theoretical patterns and the measurements in one of the wafers.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2006080061A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2006080061A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2006080061A13</originalsourceid><addsrcrecordid>eNrjZHD08_fTDfXzdPMP8vUMiVQIcAwJcQ3yU_B0cfUL8XTzdHYM8fT3UwiODA5x9Q1WcPRzUfB1DfHwdwlWCPFwDXL1d-NhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGBmYGFkDC0NHQmDhVAMVKLEw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>NON-UNIFORMITY PATTERN IDENTIFICATION SYSTEMS AND METHODS THEREOF</title><source>esp@cenet</source><creator>LIU CHIAUN</creator><creatorcontrib>LIU CHIAUN</creatorcontrib><description>A system for non-uniformity pattern identification. A storage device stores multiple theoretical patterns and measurements. Each measurement corresponds to a region on a wafer. The processing unit acquires the theoretical patterns and the measurements on at least two wafers, calculates pattern scores for the respective theoretical patterns of each wafer according to the measurements, and groups at least two of the theoretical patterns into at least one factor according to the pattern scores to identify one or more non-uniformity patterns for the wafers. Each pattern score represents the extent of similarity between one of the theoretical patterns and the measurements in one of the wafers.</description><language>eng</language><subject>CALCULATING ; COMPUTING ; COUNTING ; ELECTRIC DIGITAL DATA PROCESSING ; PHYSICS</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20060413&amp;DB=EPODOC&amp;CC=US&amp;NR=2006080061A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20060413&amp;DB=EPODOC&amp;CC=US&amp;NR=2006080061A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LIU CHIAUN</creatorcontrib><title>NON-UNIFORMITY PATTERN IDENTIFICATION SYSTEMS AND METHODS THEREOF</title><description>A system for non-uniformity pattern identification. A storage device stores multiple theoretical patterns and measurements. Each measurement corresponds to a region on a wafer. The processing unit acquires the theoretical patterns and the measurements on at least two wafers, calculates pattern scores for the respective theoretical patterns of each wafer according to the measurements, and groups at least two of the theoretical patterns into at least one factor according to the pattern scores to identify one or more non-uniformity patterns for the wafers. Each pattern score represents the extent of similarity between one of the theoretical patterns and the measurements in one of the wafers.</description><subject>CALCULATING</subject><subject>COMPUTING</subject><subject>COUNTING</subject><subject>ELECTRIC DIGITAL DATA PROCESSING</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2006</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHD08_fTDfXzdPMP8vUMiVQIcAwJcQ3yU_B0cfUL8XTzdHYM8fT3UwiODA5x9Q1WcPRzUfB1DfHwdwlWCPFwDXL1d-NhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGBmYGFkDC0NHQmDhVAMVKLEw</recordid><startdate>20060413</startdate><enddate>20060413</enddate><creator>LIU CHIAUN</creator><scope>EVB</scope></search><sort><creationdate>20060413</creationdate><title>NON-UNIFORMITY PATTERN IDENTIFICATION SYSTEMS AND METHODS THEREOF</title><author>LIU CHIAUN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2006080061A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2006</creationdate><topic>CALCULATING</topic><topic>COMPUTING</topic><topic>COUNTING</topic><topic>ELECTRIC DIGITAL DATA PROCESSING</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>LIU CHIAUN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LIU CHIAUN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>NON-UNIFORMITY PATTERN IDENTIFICATION SYSTEMS AND METHODS THEREOF</title><date>2006-04-13</date><risdate>2006</risdate><abstract>A system for non-uniformity pattern identification. A storage device stores multiple theoretical patterns and measurements. Each measurement corresponds to a region on a wafer. The processing unit acquires the theoretical patterns and the measurements on at least two wafers, calculates pattern scores for the respective theoretical patterns of each wafer according to the measurements, and groups at least two of the theoretical patterns into at least one factor according to the pattern scores to identify one or more non-uniformity patterns for the wafers. Each pattern score represents the extent of similarity between one of the theoretical patterns and the measurements in one of the wafers.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US2006080061A1
source esp@cenet
subjects CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
title NON-UNIFORMITY PATTERN IDENTIFICATION SYSTEMS AND METHODS THEREOF
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-11T06%3A11%3A31IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=LIU%20CHIAUN&rft.date=2006-04-13&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2006080061A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true