POLISHING PAD CONDITIONER WITH SHAPED ABRASIVE PATTERNS AND CHANNELS

A polishing pad conditioner comprises a base and a pad conditioning face on the base. The conditioning face comprises central and peripheral regions. Abrasive spokes having a substantially constant width of abrasive particles, extend from the central to the peripheral region. The spokes are symmetri...

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Bibliographische Detailangaben
Hauptverfasser: BALAGANI VENKATA R, NGAN KENNY K, LAZARI GEORGE
Format: Patent
Sprache:eng
Schlagworte:
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