Method to produce thin film resistor using dry etch

A method of fabricating a thin film resistor ( 100 ). The resistor material ( 104 ), e.g., NiCr, is deposited. A hard mask material ( 106 ), e.g., TiW, may be deposited over the resistor material ( 104 ). The resistor material ( 104 ) and hard mask material ( 106 ) are patterned and sputter etched t...

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Bibliographische Detailangaben

Hauptverfasser:	TSAI DANIEL, PHAN TONY T
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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