Alignment systems and methods for lithographic systems

An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to proces...

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Bibliographische Detailangaben
Hauptverfasser:	HUIJBREGTSE JEROEN, SIMONS HUBERTUS J.G, BURGHOORN JACOBUS, SCHETS SICCO I, VAN HORSSEN HERMANUS G, JEUNINK ANDRE B, MEGENS HENRY, VAN BILSEN FRANCISCUS B.M, SCHUURHUIS JOHNY R, DUNBAR ALLAN R, TOLSMA HOITE P.T, VAN HAREN RICHARD JOHANNES F, Y KOREN RAMON N, LEE BRIAN Y.B, HINNEN PAUL C
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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