Lithographic projection apparatus and device manufacturing method
A system and method is used to pattern a substrate. A projection beam received from a radiation system is patterned using an array of individually controllable elements. A portion of the projection beam is directed directly onto one of the individually controllable elements and collecting radiation...
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| creator | DE JAGER PIETER W.H |
| description | A system and method is used to pattern a substrate. A projection beam received from a radiation system is patterned using an array of individually controllable elements. A portion of the projection beam is directed directly onto one of the individually controllable elements and collecting radiation reflected therefrom using each one of a first array of focusing elements. An image of the first array of focusing elements is projected onto a second array of focusing elements using a projection system, such that radiation reflected from one of the individually controllable elements is projected via one of the focusing elements in the first array of focusing elements and the projection system to one of the focusing elements in the second array which focuses the radiation onto a spot on the substrate. |
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A projection beam received from a radiation system is patterned using an array of individually controllable elements. A portion of the projection beam is directed directly onto one of the individually controllable elements and collecting radiation reflected therefrom using each one of a first array of focusing elements. An image of the first array of focusing elements is projected onto a second array of focusing elements using a projection system, such that radiation reflected from one of the individually controllable elements is projected via one of the focusing elements in the first array of focusing elements and the projection system to one of the focusing elements in the second array which focuses the radiation onto a spot on the substrate.</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2005</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050623&DB=EPODOC&CC=US&NR=2005134819A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25569,76552</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050623&DB=EPODOC&CC=US&NR=2005134819A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>DE JAGER PIETER W.H</creatorcontrib><title>Lithographic projection apparatus and device manufacturing method</title><description>A system and method is used to pattern a substrate. 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A projection beam received from a radiation system is patterned using an array of individually controllable elements. A portion of the projection beam is directed directly onto one of the individually controllable elements and collecting radiation reflected therefrom using each one of a first array of focusing elements. An image of the first array of focusing elements is projected onto a second array of focusing elements using a projection system, such that radiation reflected from one of the individually controllable elements is projected via one of the focusing elements in the first array of focusing elements and the projection system to one of the focusing elements in the second array which focuses the radiation onto a spot on the substrate.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Lithographic projection apparatus and device manufacturing method |
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