System, method and apparatus for self-cleaning dry etch

A method for cleaning a processing chamber that includes heating an inner surface of the processing chamber to a first temperature. The first temperature can be sufficient to cause a first species to become volatile. The first species can be one of several species deposited on the inner surface. A c...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LOHOKARE SHRIKANT P, KIM YUNSANG, HOWALD ARTHUR M, BAILEY ANDREW D.III
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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