Method and apparatus of stress relief in semiconductor structures

Method and apparatus of stress relief in semiconductor structures

A method, apparatus and system are provided for relieving stress in the via structures of semiconductor structures whenever a linewidth below a via is larger than a ground-rule, including providing a via at least as large as the groundrule, providing a landing pad above the via, providing a via bar...

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Hauptverfasser: HIERLEMANN MATTHIAS, KALTALIOGLU ERDEM, HOINKIS MARK, FRIESE GERALD, WARNER DENNIS J, COWLEY ANDY
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator HIERLEMANN MATTHIAS
KALTALIOGLU ERDEM
HOINKIS MARK
FRIESE GERALD
WARNER DENNIS J
COWLEY ANDY
description A method, apparatus and system are provided for relieving stress in the via structures of semiconductor structures whenever a linewidth below a via is larger than a ground-rule, including providing a via at least as large as the groundrule, providing a landing pad above the via, providing a via bar in place of a via, slotting the metal linewidth below the via, or providing an oversize via with a sidewall spacer.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Method and apparatus of stress relief in semiconductor structures
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