Method for decreasing contact resistance of source/drain electrodes

Ammonia gas plasma is introduced to surface of source and drain electrodes before formation of passivation layer on the source and drain electrodes to passivate the surface of the source and drain electrodes, to remove residues, particles, and oxide generated by antecedent etching step, and to satur...

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Bibliographische Detailangaben

Hauptverfasser:	YUOU LEE, MINING HSU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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