Method and system for reducing contact defects using non conventional contact formation method for semiconductor cells

A method and system for providing at least one contact in a semiconductor device is described. The semiconductor device includes a substrate, an etch stop layer, an interlayer dielectric on the etch stop layer, an anti-reflective coating (ARC) layer on the interlayer dielectric, and at least one fea...

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Bibliographische Detailangaben

Hauptverfasser:	TU AMY C, HUI ANGELA T, LI WENMEI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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